| Literature DB >> 32537213 |
Ahmed Hussein Mohammed Al-Antaki1,2, Suela Kellici3, Nicholas P Power4, Warren D Lawrance5, Colin L Raston1.
Abstract
MXene (Entities:
Keywords: MXene; exfoliation; fluid flow
Year: 2020 PMID: 32537213 PMCID: PMC7277261 DOI: 10.1098/rsos.192255
Source DB: PubMed Journal: R Soc Open Sci ISSN: 2054-5703 Impact factor: 2.963
Figure 1.(a) Illustration of the VFD which houses a rapidly rotating borosilicate glass tube (20 mm OD, 17.5 mm ID), operating under an inert atmosphere of nitrogen gas. Photograph of the solution obtained (b) under confined mode of operation of the VFD (30 min) and (c) continuous flow, flow rate 0.5 ml min−1. Both modes were optimized at 4000 r.p.m., θ 45°, for a concentration of MXene 0.5 mg ml−1 in a 1 : 1 ratio of IPA and water.
Figure 2.(a) Normal syringe housing an unstable dispersion of MXene in IPA and water. (b) Syringe housing a magnetic stirrer driven by an electric motor inside the plunger.
Figure 3.Exfoliated MXene prepared using VFD processing under N2 gas, θ 45°, concentration 0.5 mg ml−1 in IPA and water (1 : 1), rotational speed 4000 r.p.m. and flow rate 0.5 ml min−1. (a) ATR-FTIR spectra, (b) Raman spectra, (c) PXRD and (d) UV–Vis spectroscopy.
Figure 4.SEM images for MXene (collected) drop cast on a silicon wafer, post-VFD processing under N2 gas, θ 45°, concentration 0.5 mg ml−1 in IPA and water (1 : 1), rotational speed 4000 r.p.m. and flow rate 0.5 ml min−1. (a) MXene as prepared, (b–e) exfoliated MXene, (f) backscattering of MXene nanoparticles and (g–i) MXene nanoparticles.
Figure 5.TEM images for MXene drop cast on grid, post-VFD processing under N2 gas, θ 45°, concentration 0.5 mg ml−1, in IPA and water (1 : 1), rotational speed 4000 r.p.m. and flow rate 0.5 ml min−1.
Figure 6.MXene nanoparticles formed during VFD processing under N2 gas, with θ 45°, concentration 0.5 mg ml−1 in IPA and water (1 : 1), rotational speed 4000 r.p.m. and flow rate 0.5 ml min−1. (a) TEM image of MXene nanoparticles drop cast on a grid. (b) SEM image of MXene nanoparticles drop cast on a silicon wafer. (c) AFM image of MXene nanoparticles drop cast on a silicon wafer. (d) DLS of exfoliated MXene generated in IPA and water (1 : 1). (e) Height of MXene nanoparticles as determined using AFM images.
Figure 7.AFM images for MXene drop cast on silicon wafers, post-VFD processing under N2 gas, θ 45°, concentration 0.5 mg ml−1 in IPA and water (1 : 1), rotational speed 4000 r.p.m. and flow rate 0.5 ml min−1.
Figure 8.Exfoliated MXene generated during VFD processing under N2 gas, θ 45°, concentration 0.5 mg ml−1 in IPA and water (1 : 1), rotational speed 4000 r.p.m. and flow rate 0.5 ml min−1. (a) TEM image for MXene sheets drop cast on a grid. (b) SEM image of MXene sheets drop cast on a silicon wafer. (c) AFM image of MXene sheets drop cast on a silicon wafer. (d) Count of MXene sheets from AFM images. (e) Height of MXene sheets from AFM images.