| Literature DB >> 32296733 |
Kilian B Lohmann1, Jay B Patel1, Mathias Uller Rothmann1, Chelsea Q Xia1, Robert D J Oliver1, Laura M Herz1, Henry J Snaith1, Michael B Johnston1.
Abstract
Understanding and controlling grain growth in metal halide perovskite polycrystalline thin films is an important step in improving the performance of perovskite solar cells. We demonstrate accurate control of crystallite size in CH3NH3PbI3 thin films by regulating substrate temperature during vacuum co-deposition of inorganic (PbI2) and organic (CH3NH3I) precursors. Films co-deposited onto a cold (-2 °C) substrate exhibited large, micrometer-sized crystal grains, while films that formed at room temperature (23 °C) only produced grains of 100 nm extent. We isolated the effects of substrate temperature on crystal growth by developing a new method to control sublimation of the organic precursor, and CH3NH3PbI3 solar cells deposited in this way yielded a power conversion efficiency of up to 18.2%. Furthermore, we found substrate temperature directly affects the adsorption rate of CH3NH3I, thus impacting crystal formation and hence solar cell device performance via changes to the conversion rate of PbI2 to CH3NH3PbI3 and stoichiometry. These findings offer new routes to developing efficient solar cells through reproducible control of crystal morphology and composition.Entities:
Year: 2020 PMID: 32296733 PMCID: PMC7147257 DOI: 10.1021/acsenergylett.0c00183
Source DB: PubMed Journal: ACS Energy Lett Impact factor: 23.101
Figure 1Scanning electron microscopy (SEM) images of co-evaporated CH3NH3PbI3 (MAPbI3) devices deposited at 5 different substrate temperature conditions over 204 min, as graphically depicted in (a). (b) Cross-sectional images of full devices with the following structure: Fluorene-doped tin oxide (FTO)/C60 (blue)/MAPbI3 (orange)/Spiro-OMeTAD (green)/Au (yellow). (c) Top-down images of the same devices after removal of the gold and spiro layer. The scale bar represents 1 μm for both top-down and cross-sectional images. (d, e) J–V curves and steady-state PCE for the devices on which SEM was done, measured under simulated AM1.5 100 mW cm–2 irradiance. Further details of device fabrication, scan parameters, and additional images can be found in the Supporting Information.
Figure 2(a) XRD spectra of devices made via the five deposition conditions, after removal of background, normalized to the highest peak, and corrected for angular tilt by using the FTO (110) peak at 26.5°. The black diamonds represent the PbI2 (001) peak at 12.7°, the black circles show the position of FTO peaks, while the rest of the peaks are from tetragonal MAPbI3, as denoted by the indices. (b) Mean Urbach energy measurements for the corresponding devices. (c) Unnormalized peak intensity of the PbI2 (001) peak at 12.7°, as calculated from the pseudo-Voigt fit. (d) Full width at half-maximum (fwhm) of the MAPbI3 (222)/(130) peak at 31.9°, as calculated from the pseudo-Voigt fit. The red line represents the instrument broadening, calculated from a Si reference. XRD measurements were taken with a Cu Kα X-ray source; additional information on the equipment and fitting methods can be found in the Supporting Information.
Figure 3(a) Box plots of the J–V characteristics taken from eight devices made according to the five different deposition conditions. (b) Internal quantum efficiency (IQE) curves of the highest performing device measured from each of the five different deposition conditions.