| Literature DB >> 32206743 |
Yu Kasahara1, Yusuke Sato1, Marcos K Masukawa1, Yukiko Okuda1, Masahiro Takinoue1.
Abstract
We report a photolithographic method for the shape control of DNA hydrogels based on photo-activated self-assembly of Y-shaped DNA nanostructures (Y-motifs). To date, various methods to control the shape of DNA hydrogels have been developed to enhance the functions of the DNA hydrogel system. However, photolithographic production of shape-controlled DNA hydrogels formed through the self-assembly of DNA nanostructures without the use of radical polymerizations has never been demonstrated, although such a method is expected to be applied for the shape-control of DNA hydrogels encapsulating sensitive biomolecules, such as proteins. In this study, we used a photo-activated linker to initiate the self-assembly of Y-motifs, where the cross-linker DNA was at first inactive but was activated after UV light irradiation, resulting in the formation of shape-controlled DNA hydrogels only at the UV-exposed area produced by photomasks. We believe that this method will be applied for the construction of biohybrid machines, such as molecular robots and artificial cells that contain intelligent biomolecular devices, such as molecular sensors and computers. © Author(s).Entities:
Year: 2020 PMID: 32206743 PMCID: PMC7083653 DOI: 10.1063/1.5132929
Source DB: PubMed Journal: APL Bioeng ISSN: 2473-2877
FIG. 1.Conceptual illustration of the photolithographic formation of shape-controlled DNA-motif hydrogels based on the photo-activated self-assembly of DNA nanostructures.
FIG. 2.Designs of DNAs. (a) Design and sequences of Y-shaped DNA nanostructures (named “Y-motif A” and “Y-motif B”) and cross-linker DNA sequence. The cross-linker DNA sequence has sequences complementary to the sticky ends of Y-motif A and Y-motif B. (b) Design and sequence of inactivated linker. The inactivated linker has the cross-linker DNA sequence (cyan and red) and the covering sequence (gray) with photo-cleavable (PC) spacers at three “X” positions. (c) The mechanism of activation of the inactivated linker. The PC spacers are cleaved by the irradiation of UV light with a wavelength of 300–350 nm, causing the covering DNA sequences to dissociate, releasing the activated linker.
FIG. 3.(a) Confirmation of Y-motif DNA formation using non-denaturing PAGE. M: 100-bp DNA ladder marker; L1–L3: YA-1, YA-2, or YA-3, respectively (2.5 μM each); L4: YA-1 and YA-2 (2.5 μM each); L5: YA-2 and YA-3 (2.5 μM each); L6: YA-1 and YA-3 (2.5 μM each); L7: YA-1, YA-2, and YA-3 (2.5 μM each); L8–L10: YB-1, YB-2, or YB-3, respectively (2.5 μM each); L11: YB-1 and YB-2 (2.5 μM each); L12: YB-2 and YB-3 (2.5 μM each); L13: YB-1 and YB-3 (2.5 μM each); and L14: YB-1, YB-2, and YB-3 (2.5 μM each). (b) Confirmation of activation of inactivated linker (i.e., photo-cleavage and dissociation of the covering DNA sequence from the inactivated linker) using denaturing PAGE. M: 10-bp DNA ladder marker; L1–L5: 1 μM inactivated linker with UV light irradiation for 0 min, 1 min, 3 min, 5 min, and 8 min, respectively; L6: 1 μM activated linker without UV light irradiation. (c) Melting analysis of the inactivated linker before and after UV light irradiation. (d) Confirmation of DNA-motif hydrogel formation by UV light irradiation using non-denaturing PAGE. M: 100-bp DNA ladder marker; L1: 2.5 μM Y-motif A and 2.5 μM Y-motif B, without UV light irradiation; L2: 2.5 μM Y-motif A, 2.5 μM Y-motif B, and 7.5 μM inactivated linker, without UV light irradiation; L3: 2.5 μM Y-motif A, 2.5 μM Y-motif B, and 7.5 μM inactivated linker, with UV light irradiation; L4: 2.5 μM Y-motif A, 2.5 μM Y-motif B, and 7.5 μM activated linker, without UV light irradiation. (e) Microscopy image of aggregated DNA-motif hydrogel microparticles formed by UV light irradiation. The temperatures when UV light was irradiated were 25 °C, 35 °C, and 45 °C, respectively.
FIG. 4.DNA-motif hydrogel formation with UV light irradiation. (a) The schematic illustration of the gelation chamber made of two cover glasses. (b) The schematic illustration of UV irradiation through the photomask. To prevent evaporation of the DNA solution, a water bath was placed under the gelation chamber in a closed vessel. (c) The photograph of a prepared DNA-motif hydrogel inside the gelation chamber. (d) The schematic illustration of how to extract the prepared DNA-motif hydrogel from the gelation chamber. (e) The photograph of an extracted DNA-motif hydrogel.
FIG. 5.The formation of shape-controlled DNA-motif hydrogel with UV light irradiation. (a) The photograph of photomasks for the characters, “D,” “N,” and “A.” (b) The photographs of prepared shape-controlled DNA-motif hydrogels with the shapes of “D,” “N,” and “A.”
FIG. 6.Investigation of the resolution of this method. (a) The photograph of photomasks for cross patterns with different sizes. (b) The photographs of the prepared shape-controlled DNA-motif hydrogels. (c) Comparison of arm width of prepared DNA-motif hydrogels with that of photomasks. (d) The arm width ratio of prepared DNA-motif hydrogels to that of photomasks.