| Literature DB >> 32132588 |
Samantha Brixi1, Owen A Melville1, Brendan Mirka1, Yinghui He2, Arthur D Hendsbee2, Han Meng2, Yuning Li2, Benoît H Lessard3.
Abstract
N-type organic semiconductors are notoriously unstable in air, requiring the design of new materials that focuses on lowering their LUMO energy levels and enhancing their air stability in organic electronic devices such as organic thin-film transistors (OTFTs). Since the discovery of the notably air stable and high electron mobility polymer poly{[N,N'-bis (2-octyldodecyl)- naphthalene-1,4,5,8-bis(dicarboximide)-2,6-diyl]-alt-5,5'-(2,29-bisthiophene)} (N2200), it has become a popular n-type semiconductor, with numerous materials being designed to mimic its structure. Although N2200 itself is well-studied, many of these comparable materials have not been sufficiently characterized to compare their air stability to N2200. To further the development of air stable and high mobility n-type organic semiconductors, N2200 was studied in organic thin film transistors alongside three N2200-based analogues as well as a recently developed polymer based on a (3E,7E)-3,7-bis(2-oxoindolin-3-ylidene)benzo[1,2-b:4,5-b']difuran-2,6(3 H,7 H)-dione (IBDF) core. This IBDF polymer has demonstrated promising field-effect mobility and air stability in drop-cast OTFTs. While N2200 outperformed its analogues, the IBDF-based polymer displayed superior air and temperature stability compared to N2200. Overall, polymers with more heteroatoms displayed greater air stability. These findings will support the development of new air-stable materials, and further demonstrate the persistent need for the development of novel n-type semiconductors.Entities:
Year: 2020 PMID: 32132588 PMCID: PMC7055259 DOI: 10.1038/s41598-020-60812-x
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1(a) Polymers studied in this report and their respective frontier energy levels. (b) Structure of a bottom gate bottom contact organic thin film transistor (OTFT). Corresponding lowest unoccupied molecular orbital (LUMO) and highest occupied molecular orbital (HOMO) energy levels for each polymer obtained through cyclic voltammetry (CV) and UV-visible spectra presented in Fig. S1.
Properties of n-type polymers at 30 °C in air or vacuum environment.
| N2200 | F-N2200 | NDI-20-T | NDIO-20-T | PIBDFBT-37 | ||||||
|---|---|---|---|---|---|---|---|---|---|---|
| Vacuum | Air | Vacuum | Air | Vacuum | Air | Vacuum | Air | Vacuum | Air | |
µ (cm2/Vs) | 0.06 | 0.03 | 0.03 | 0.005 | 0.006 | 0.002 | 0.001 | 0.0006 | 0.1 | 0.02 |
| Ion/off | 103 | 102 | 104 | 103 | 104 | 103 | 103 | 103 | 104 | 103 |
| VT (V) | 23.9 | 33.9 | −0.31 | 10.6 | 11.4 | 18.4 | 15.5 | 32.9 | 32.1 | 41.5 |
HOMO (eV)a) | −5.4 | −5.6 | −5.8 | −5.9 | −5.2 (−5.7)b) | |||||
LUMO (eV)a) | −3.9 | −3.9 | −3.9 | −4.1 | −3.9 | |||||
a)Lowest unoccupied molecular orbital (LUMO) and highest occupied molecular orbital (HOMO) energy levels (eV) were obtained by CV and band-gaps determined by UV-vis, presented in Fig. S1.
b)Values presented in brackets were obtained directly from the onset of oxidation in CV experiments, while all other values are calculated by combining the band-gap from UV-visible spectroscopic studies with the LUMO value obtained by CV.
Subthreshold swing (S) characteristics and number of interface traps (N) of devices characterized in vacuum and in air at room temperature.
| Vacuum | Air | Vacuum | Air | |
|---|---|---|---|---|
| N2200 | 4.7 | 5.1 | 7.4 × 1012 | 8.0 × 1012 |
| FN2200 | 4.1 | 5.5 | 6.4 × 1012 | 8.7 × 1012 |
| NDI-20-T | 2.9 | 3.1 | 4.6 × 1012 | 4.9 × 1012 |
| NDIO-20-T | 3.7 | 5.5 | 5.7 × 1012 | 8.7 × 1012 |
| PIBDFBT-37 | 6.4 | 6.9 | 1.0 × 1013 | 1.1 × 1013 |
Figure 2Effect of temperature under vacuum (P < 0.1 Pa) on electron mobility vs gate voltage (V) of various n-type semiconducting polymers all in a bottom gate bottom contact (BGBC) organic thin film transistor (OTFT) device configuration.
Figure 3Effect of temperature in air on electron mobility vs gate voltage (V) of various n-type semiconducting polymers all in a bottom gate bottom contact (BGBC) organic thin film transistor (OTFT) device configuration.
Surface RMS roughness (nm) of drop-cast polymer samples following to heating in either air or vacuum at 100 °C determined using atomic force microscopy.
| N2200 | F-N2200 | NDI-20-T | NDIO-20-T | PIBDFBT-37 | |
|---|---|---|---|---|---|
| Vacuum heated | 1.13 | 1.23 | 0.884 | 0.786 | 2.16 |
| Air heated | 1.23 | 1.77 | 1.21 | 0.988 | 1.76 |
Figure 4Atomic force microscopy (AFM) of 5 µm × 5 µm sections of each polymer film after annealing in vacuum and air.
Figure 5Electron mobility (µ) vs gate voltage (V) of various n-type semiconducting polymers before and after heating films to 100 °C in air. All polymers characterized in a bottom gate bottom contact (BGBC) organic thin film transistor (OTFT) device configuration in a vacuum atmosphere.
Figure 6Average of normalized mobilities (µ/µday 0) for various n-type semiconducting polymers characterized daily over a period of one month. Each chip contains four 20 µm channel length devices which were characterized in air and averaged for each data point each day.
Figure 7Normalized UV-vis comparison of thin films of n-type polymer materials before (solid lines) and after (dotted lines) heating to 130 °C in air (black) or vacuum (red).
Percent change in characteristic peak height intensity of UV-visible spectra.
| N2200 | F-N2200 | NDI-20-T | NDIO-20-T | PIBDFBT-37 | |
|---|---|---|---|---|---|
| Peak (nm) | 705 | 685 | 620 | 605 | 790 |
| Air | −18.4% | −22.4% | −25.0% | −11.4% | −0.4% |
| Vacuum | −4.2% | −14.4% | −16.3% | −19.8% | +0.7% |