| Literature DB >> 32017573 |
Dimitars Jevtics1, John McPhillimy1, Benoit Guilhabert1, Juan A Alanis2, Hark Hoe Tan3, Chennupati Jagadish3, Martin D Dawson1, Antonio Hurtado1, Patrick Parkinson2, Michael J Strain1.
Abstract
Semiconductor nanowire (NW) lasers are a promising technology for the realization of coherent optical sources with ultrasmall footprint. To fully realize their potential in on-chip photonic systems, scalable methods are required for dealing with large populations of inhomogeneous devices that are typically randomly distributed on host substrates. In this work two complementary, high-throughput techniques are combined: the characterization of nanowire laser populations using automated optical microscopy, and a high-accuracy transfer-printing process with automatic device spatial registration and transfer. Here, a population of NW lasers is characterized, binned by threshold energy density, and subsequently printed in arrays onto a secondary substrate. Statistical analysis of the transferred and control devices shows that the transfer process does not incur measurable laser damage, and the threshold binning can be maintained. Analysis on the threshold and mode spectra of the device populations proves the potential for using NW lasers for integrated systems fabrication.Entities:
Keywords: III−V Nanowire Lasers; Nanophotonics; Photoluminescence; Transfer-Printing
Year: 2020 PMID: 32017573 PMCID: PMC7146854 DOI: 10.1021/acs.nanolett.9b05078
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189
Figure 1Schematic of the process: (i) NW lasers on their growth substrate are released using a large PDMS block, (ii) transferred onto a target quartz disk, and randomly distributed on the surface. (iii) Device populations are characterized using an automated scanning microscopy system and binned by threshold. (iv) Selected NW devices are individually picked using a PDMS μ-stamp and (v) printed onto a second substrate in regular arrays. (vi) Target devices are recharacterized with the system.
Figure 2Quartz substrates with printed NW laser devices. (a) Randomly distributed first transfer and (b) 5 device array of binned and deterministically placed devices.
Figure 3(a) Spatial map of 221 NWs (red circles) on quartz substrate identified by the characterization rig. Dark grids indicate alignment markers on the substrate, with a marker at (0, 0) being the reference point. (b) Histogram of measured NW thresholds before the selection and transfer processes. (c) Binning of selected NW lasers by lasing threshold energy. (d) Absolute coordinates of the transfer-printed arrays on the second quartz disk.
Figure 4Correlation of laser threshold values between two measurements for printed and unprinted NW lasers. Dashed line represents ideal correlation.
Figure 5Correlation of peak lasing wavelength between two measurements for printed (red circles) and unprinted (black grids) devices. Dashed line represents ideal correlation.
Figure 6Three representative cases of the printed and unprinted devices which depict state of the spectrum pre- and postprocessing: (a) reconstructed, (b) partially reconstructed, (c) non-reconstructed spectrum.
Figure 7Scatter plot showing modal cases relatively to the threshold change in the NW devices: (a) printed and (b) unprinted devices.
Threshold Fluence Correlations for Devices Grouped by Modal Spectrum Correlations
| unprinted | printed | |||
|---|---|---|---|---|
| mode spectrum case [unprinted|printed] | ρ-value | ρ-value | ||
| all devices [74|24] | 0.435 | <.001 | 0.462 | 0.023 |
| case A [45|8] | 0.584 | <.001 | 0.841 | 0.009 |
| case B [25|8] | 0.265 | 0.200 | 0.239 | 0.568 |
| case C [4|8] | –0.294 | 0.706 | 0.006 | 0.989 |