Literature DB >> 31618496

SnSe/MoS2 van der Waals Heterostructure Junction Field-Effect Transistors with Nearly Ideal Subthreshold Slope.

Jian Guo1, Laiyuan Wang1, Yiwei Yu1, Peiqi Wang1, Yu Huang2, Xiangfeng Duan1.   

Abstract

The minimization of the subthreshold swing (SS) in transistors is essential for low-voltage operation and lower power consumption, both critical for mobile devices and internet of things (IoT) devices. The conventional metal-oxide-semiconductor field-effect transistor requires sophisticated dielectric engineering to achieve nearly ideal SS (60 mV dec-1 at room temperature). However, another type of transistor, the junction field-effect transistor (JFET) is free of dielectric layer and can reach the theoretical SS limit without complicated dielectric engineering. The construction of a 2D SnSe/MoS2 van der Waals (vdW) heterostructure-based JFET with nearly ideal SS is reported. It is shown that the SnSe/MoS2 vdW heterostructure exhibits excellent p-n diode rectifying characteristics with low saturate current. Using the SnSe as the gate and MoS2 as the channel, the SnSe/MoS2 vdW heterostructure exhibit well-behavioured n-channel JFET characteristics with a small pinch-off voltage VP of -0.25 V, nearly ideal subthreshold swing SS of 60.3 mV dec-1 and high ON/OFF ratio over 106 , demonstrating excellent electronic performance especially in the subthreshold regime.
© 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Entities:  

Keywords:  2D semiconductors; junction field-effect transistor; subthreshold swing; van der Waals heterostructures

Year:  2019        PMID: 31618496     DOI: 10.1002/adma.201902962

Source DB:  PubMed          Journal:  Adv Mater        ISSN: 0935-9648            Impact factor:   30.849


  4 in total

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Authors:  Chengxu Shen; Zhigang Yin; Fionn Collins; Nicola Pinna
Journal:  Adv Sci (Weinh)       Date:  2022-06-16       Impact factor: 17.521

2.  Mixed-Dimensional 1D/2D van der Waals Heterojunction Diodes and Transistors in the Atomic Limit.

Authors:  Jakub Jadwiszczak; Jeffrey Sherman; David Lynall; Yang Liu; Boyan Penkov; Erik Young; Rachael Keneipp; Marija Drndić; James C Hone; Kenneth L Shepard
Journal:  ACS Nano       Date:  2022-01-11       Impact factor: 18.027

3.  Growth of Tellurium Nanobelts on h-BN for p-type Transistors with Ultrahigh Hole Mobility.

Authors:  Peng Yang; Jiajia Zha; Guoyun Gao; Long Zheng; Haoxin Huang; Yunpeng Xia; Songcen Xu; Tengfei Xiong; Zhuomin Zhang; Zhengbao Yang; Ye Chen; Dong-Keun Ki; Juin J Liou; Wugang Liao; Chaoliang Tan
Journal:  Nanomicro Lett       Date:  2022-04-19

4.  Transferred metal gate to 2D semiconductors for sub-1 V operation and near ideal subthreshold slope.

Authors:  Jingli Wang; Lejuan Cai; Jiewei Chen; Xuyun Guo; Yuting Liu; Zichao Ma; Zhengdao Xie; Hao Huang; Mansun Chan; Ye Zhu; Lei Liao; Qiming Shao; Yang Chai
Journal:  Sci Adv       Date:  2021-10-27       Impact factor: 14.136

  4 in total

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