| Literature DB >> 31547043 |
Baizhu Lin1, Yunji Yi2, Yue Cao3, Jiawen Lv4, Yue Yang5, Fei Wang6, Xiaoqiang Sun7, Daming Zhang8.
Abstract
This paper presents a novel electrode thermal writing waveguide based on a heating-induced refractive index change mechanism. The mode condition and the electrode thermal writing parameters were optimized, and the output patterns of the optical field were obtained in a series of simulations. Moreover, the effect of various adjustments on the sensing range of the nanoimprint M-Z temperature sensor was analyzed theoretically. A refractive index asymmetry Mach-Zehnder (M-Z) waveguide sensor with a tunable refractive index for a waveguide core layer was simulated with a length difference of 946.1 µm. The optimal width and height of the invert ridge waveguide were 2 μm and 2.8 μm, respectively, while the slab thickness was 1.2 μm. The sensing accuracy was calculated to range from 2.0896 × 104 to 5.1252 × 104 in the 1.51-1.54 region. The sensing fade issue can be resolved by changing the waveguide core refractive index to 0.001 via an electrode thermal writing method. Thermal writing a single M-Z waveguide arm changes its refractive index by 0.03. The sensor's accuracy can be improved 1.5 times by the proposed method. The sensor described in this paper shows great prospects in organism temperature detection, molecular analysis, and biotechnology applications.Entities:
Keywords: integrated optics; polymer waveguides; sensors; thermal writing waveguide
Year: 2019 PMID: 31547043 PMCID: PMC6843899 DOI: 10.3390/mi10100628
Source DB: PubMed Journal: Micromachines (Basel) ISSN: 2072-666X Impact factor: 2.891
Figure 1(a) Schematic of the electrode thermal writing waveguide and (b) cross-sectional view of the waveguide.
Figure 2(a) Optical field distribution before and (b) after applying electric power and (c) thermal field distribution of the electrode thermal writing waveguide.
Figure 3(a) Measuring process of applying electric power; (b); the testing photo of the TO switch with electric power applied; (c) Relative output patterns before power applied and (d) output patterns after the electric power applied.
Figure 4The schematic of the asymmetric Mach–Zehnder (M–Z) waveguide arrays.
Figure 5Fabrication process of the waveguide by nanoimprint and schematic diagram of thermal writing.
Figure 6(a) Cross-section and (b) optical field distribution of inverted ridge waveguide.
Figure 7The parameters schematic of the Asymmetrical Mach–Zehnder Interferometer (AMZI) waveguide sensor with high sensing accuracy.
Asymmetrical Mach–Zehnder Interferometer (AMZI) sensor parameters associated with various length differences.
|
| Δ | ||
|---|---|---|---|
| 0.3 | 9997 | 24591.6 | 946.1 |
| 0.25 | 9997 | 23874.6 | 654.4 |
| 0.2 | 9992 | 23121.9 | 416.2 |
| 0.15 | 9998 | 22369.4 | 232.5 |
| 0.1 | 9997 | 21566.1 | 102.3 |
| 0.05 | 10075 | 20949.0 | 25.5 |
Figure 8Normalized output optical intensity with various sensing arm length differences.
Figure 9Transmission intensity of sensor with various length differences and core refractive indices.
Figure 10Schematics (a) and output power (b) of local electrode thermal writing device.
Figure 11The output power of AMZ sensor with an optimized Y-splitter power (with loss of 2.5 dB/cm, ΔL = 946.1 µm).