| Literature DB >> 31405012 |
Hai-Tao Ren1,2,3, Jing Han1, Ting-Ting Li1,2, Qi Lin4, Jia-Horng Lin5,6,7,8,9,10,11, Ching-Wen Lou12,13,14,15,16.
Abstract
The fate of arsenic in the water environment is of great concern. Here, the influences of oxalic acid and UV light illumination on the dissolution of naked ferrihydrite (Fhy), Fhy loaded with As(V) [Fhy*-As(V)], as well as the fate of As(V) at pH 3.0 were studied. With the assistance of oxalic acid, complexes of Fe(III)-oxalic acid produced on Fhy/Fhy*-As(V) were reduced to Fe(II)-oxalic acid by photo-induced electrons under UV light irradiation. UV light has nearly no impact on the release of As(V) in the system of Fhy*-As(V) without the assistance of oxalic acid. Nevertheless, in the existence of oxalic acid, UV light illumination resulted in the contents of liberated As(V) decreased by 775-1300% compared to that without light. Considering the coexistence of As(V), oxalic acid as well as iron oxides in aquatic environments, the present study revealed that UV illumination could enhance the retention of As(V) on Fhy in the acidic water environment containing oxalic acid.Entities:
Keywords: As(V); fate; ferrihydrite; oxalic acid; photodissolution
Year: 2019 PMID: 31405012 PMCID: PMC6723842 DOI: 10.3390/nano9081143
Source DB: PubMed Journal: Nanomaterials (Basel) ISSN: 2079-4991 Impact factor: 5.076
Figure 1XRD patterns of Fhy (a) before and (b) after the photodissolution with oxalic acid.
The loaded As(V) amounts on Fhy at pH 3.0.
| No. | As(V) Loading (mg g−1) |
|---|---|
| Fhy*-As(V)-a | 99.9 |
| Fhy*-As(V)-b | 146.8 |
| Fhy*-As(V)-c | 196.8 |
Figure 2Dissolution kinetics with suspensions of 0.1 g L−1 Fhy (a) under UV illumination and (b) in the dark at pH 3.0 without oxalic acid.
Figure 3Dissolution kinetics with suspensions of 0.1 g L−1 Fhy at pH 3.0 (a) under UV illumination and (b) in the dark in the presence of 1.0 mM oxalic acid.
Figure 4TEM analysis of Fhy (a) before and (b) after the photodissolution with 1.0 mM oxalic acid.
Figure 5FTIR analysis of Fhy and Fhy*-As(V) after the photodissolution with 1.0 mM oxalic acid.
Figure 6Dissolution kinetics under UV illumination with suspensions of 0.1 g L−1 Fhy*-As(V) at pH 3.0. Dissolved TFe (a), dissolved Fe(II) (b), and As(V) (c) were measured.
Figure 7Dissolution kinetics in the dark with suspensions of 0.1 g L−1 Fhy*-As(V) at pH 3.0 with 1.0 mM oxalic acid. Dissolved TFe (a), dissolved Fe(II) (b), and As(V) (c) were measured.
Figure 8Dissolution kinetics under UV illumination with suspensions of 0.1 g L−1 Fhy*-As(V) at pH 3.0 with 1.0 mM oxalic acid. Dissolved TFe (a), dissolved Fe(II) (b), and As(V) (c) were measured.
Figure 9Proposed mechanisms of Fhy photodissolution and As(V) migration in Fhy*-As(V).