| Literature DB >> 31057819 |
Zhuolin Xiang1,2,3,4, Jingquan Liu5, Chengkuo Lee1,2,3,4.
Abstract
The neural interface is a key component in wireless brain-computer prostheses. In this study, we demonstrate that a unique three-dimensional (3D) microneedle electrode on a flexible mesh substrate, which can be fabricated without complicated micromachining techniques, is conformal to the tissues with minimal invasiveness. Furthermore, we demonstrate that it can be applied to different functional layers in the nervous system without length limitation. The microneedle electrode is fabricated using drawing lithography technology from biocompatible materials. In this approach, the profile of a 3D microneedle electrode array is determined by the design of a two-dimensional (2D) pattern on the mask, which can be used to access different functional layers in different locations of the brain. Due to the sufficient stiffness of the electrode and the excellent flexibility of the mesh substrate, the electrode can penetrate into the tissue with its bottom layer fully conformal to the curved brain surface. Then, the exposed contact at the end of the microneedle electrode can successfully acquire neural signals from the brain.Entities:
Keywords: 3D microneedle electrode; drawing lithography; flexible electrode; neural interfaces
Year: 2016 PMID: 31057819 PMCID: PMC6444742 DOI: 10.1038/micronano.2016.12
Source DB: PubMed Journal: Microsyst Nanoeng ISSN: 2055-7434 Impact factor: 7.127
Figure 1A schematic depiction of the flexible microneedle electrode. (a) The design and geometry of the flexible microneedle electrode. (b) The 2D mask design that determines the 3D microneedle electrode length. (c) The microneedle electrode array with different profiles. 2D, two dimensional; 3D, three dimensional.
Figure 2Fabrication process for the flexible microneedle electrode. (a) Bottom layer defined by UV lithography technology. (b) Metal tracing formed by lift-off process. (c) SU-8 adhesion layer patterning; (d) Top layer defined by UV lithography technology. (e) SU-8 pillar array formed by UV lithography technology. (f) SU-8 sharp tips formed by drawing lithography technology. (g) Gold layer deposition on the surface of microneedle electrode. (h) Parylene insulation layer deposition on the microneedle electrode. (i) Electrode release from the substrate.
Figure 3Fabrication result for a flexible microneedle electrode. (a) An optical image of the flexible microneedle electrode attached to a curved surface (scale bar: 2 mm). (b) Details of the microneedle electrode (scale bar: 1 mm). (c) SEM image of the exposed microneedle electrode contact (scale bar: 100 μm).
Figure 4Fabrication of a microneedle array with different lengths. (a and b) The mathematic model for the drawing lithography process. (c) Convex and concave profiles of microneedle electrode arrays. (d) Microneedle electrodes with different lengths fabricated from different drawing pillars.
Figure 5Mechanical characterization of the microneedle electrode. (a) Flexibility evaluation of the fabricated flexible microneedle electrode. (b) Cross section of the flexible substrate. (c) Schematic drawing of the attached flexible substrate on the curved brain surface. (d) The buckling tests of five different prototypes fabricated from a drawing pillar with a diameter of 300 μm. (e) The relationship between the buckling force and the diameter of the drawing pillars.
Figure 6In vivo implantation of the fabricated flexible microneedle electrode. (a) Implanted location of the fabricated microneedle electrode array. The blue circle indicates the implantation location. (b) The mesh substrate is conformal to the curved brain surface after the implantation (scale bar: 1 mm). (c) A 1-s segment from the natural recordings of a representative electrode contact. (d) An enlarged portion of the signal. (e) The normalized natural neural activity from each electrode. The x–y axes indicate the location of each microneedle electrode. (f) The normalized neural activity after the stimulation is delivered to the hind paw.