Literature DB >> 30913981

Plasma-sensitive Escherichia coli mutants reveal plasma resistance mechanisms.

Marco Krewing1, Fabian Jarzina1, Tim Dirks1, Britta Schubert1, Jan Benedikt2, Jan-Wilm Lackmann1, Julia E Bandow1.   

Abstract

Non-thermal atmospheric pressure plasmas are investigated as augmenting therapy to combat bacterial infections. The strong antibacterial effects of plasmas are attributed to the complex mixture of reactive species, (V)UV radiation and electric fields. The experience with antibiotics is that upon their introduction as medicines, resistance occurs in pathogens and spreads. To assess the possibility of bacterial resistance developing against plasma, we investigated intrinsic protective mechanisms that allow Escherichia coli to survive plasma stress. We performed a genome-wide screening of single-gene knockout mutants of E. coli and identified 87 mutants that are hypersensitive to the effluent of a microscale atmospheric pressure plasma jet. For selected genes ( cysB, mntH, rep and iscS) we showed in complementation studies that plasma resistance can be restored and increased above wild-type levels upon over-expression. To identify plasma-derived components that the 87 genes confer resistance against, mutants were tested for hypersensitivity against individual stressors (hydrogen peroxide, superoxide, hydroxyl radicals, ozone, HOCl, peroxynitrite, NO•, nitrite, nitrate, HNO3, acid stress, diamide, heat stress and detergents). k-means++ clustering revealed that most genes protect from hydrogen peroxide, superoxide and/or nitric oxide. In conclusion, individual bacterial genes confer resistance against plasma providing insights into the antibacterial mechanisms of plasma.

Entities:  

Keywords:  antibacterial mechanism; atmospheric pressure plasma; disinfection; iron–sulfur cluster; non-thermal plasma; stress response

Mesh:

Substances:

Year:  2019        PMID: 30913981      PMCID: PMC6451402          DOI: 10.1098/rsif.2018.0846

Source DB:  PubMed          Journal:  J R Soc Interface        ISSN: 1742-5662            Impact factor:   4.118


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