| Literature DB >> 30696016 |
Hosung Kang1, Wajahat H Abbasi2, Seong-Woo Kim3, Jungsuk Kim4,5.
Abstract
This paper presents a fully integrated photodiode-based low-power and low-mismatch stimulator for a subretinal prosthesis. It is known that a subretinal prosthesis achieves 1600-pixel stimulators on a limited single-chip area that is implanted beneath the bipolar cell layer. However, the high-density pixels cause high power dissipation during stimulation and high fabrication costs because of special process technologies such as the complementary metal-oxide semiconductor CMOS image sensor process. In addition, the many residual charges arising from the high-density pixel stimulation have deleterious effects, such as tissue damage and electrode corrosion, on the retina tissue. In this work, we adopted a switched-capacitor current mirror technique for the single-pixel stimulator (SPStim) that enables low power consumption and low mismatch in the subretinal device. The customized P+/N-well photodiode used to sense the incident light in the SPStim also reduces the fabrication cost. The 64-pixel stimulators are fabricated in a standard 0.35-μm CMOS process along with a global digital controller, which occupies a chip area of 4.3 × 3.2 mm² and are ex-vivo demonstrated using a dissected pig eyeball. According to measured results, the SPStim accomplishes a maximum biphasic pulse amplitude of 143 μA, which dissipates an average power of 167 μW in a stimulation period of 5 ms, and an average mismatch of 1.12 % between the cathodic and anodic pulses.Entities:
Keywords: digital controller; ex-vivo demonstration; high-density pixels; implantable device; light sensor; photodiode; subretinal prosthesis
Mesh:
Year: 2019 PMID: 30696016 PMCID: PMC6387200 DOI: 10.3390/s19030536
Source DB: PubMed Journal: Sensors (Basel) ISSN: 1424-8220 Impact factor: 3.576
Figure 1(a) System overview of a subretinal prosthesis that is implanted beneath the bipolar cell layer, (b) simplified architecture of the subretinal device including the single-pixel stimulator.
Figure 2(a) Circuit diagram of the proposed single-pixel stimulator adopting a customized photodiode and a switched capacitor current mirror technique; (b) simulated transient waveform to show input and analog output.
Figure 3(a) Layout of the global digital controller embedded onto the signal chip with a 64-pixel stimulator array (its active area is gauged as 441.5 × 425.5 μm2); (b) micrograph of the 64-pixel stimulator array; (c) layout of the proposed single-pixel stimulator, which occupies an active area of 114 × 117 μm2.
Figure 4(a) Measured transient waveforms for the biphasic current and digital input pulses, where a 10-kΩ resistor was used to model the electrode resistance; (b) anodic and cathodic current amplitudes varying with incident light intensity.
Figure 5(a) Illustration of the ex-vivo demonstration setup; (b) ex-vivo experiment using a dissected pig eyeball.
Electrical performance Summary and comparison of the proposed single-pixel stimulator (SPStim).
| [ | [ | [ | [ | [ | This Work | |
|---|---|---|---|---|---|---|
| CMOS Process | 0.35-μm standard | 0.18-μm CIS ** | 0.18-μm CIS ** | 0.35-μm BCD *** | 0.35-μm CIS ** | 0.35-μm standard |
| Supply voltage [V] | 5 | ± 1.65 | 0.5, 1.8 | 5, 12 | ± 2 | ± 1.65 |
| Chip area [mm2] | 1.0 × 2.7 | 2.2 × 2.2 | 1.9 × 1.9 | 2.5 × 1.2 | 3 × 3.5 | 4.3 × 3.2 |
| Single pixel area [μm2] | 200 × 200 | 127 × 167 | 30 × 30 | 55 × 50 | 30 × 30 | 114 × 117 |
| Dynamic range [Lux] | - | 400–1200 | 1–1000 | 100–250 | 0.1–10,000 | 400–1600 |
| Pulse amplitude * [μA] | 50–1050 | 0–343 | 0–50 | 0–300 | 0–100 | 0–143 |
| On-chip digital controller | Yes | No | Yes | No | Yes | Yes |
| Pulse width * [ms] | - | - | - | - | 4 | 0.5–5 |
| Pulse period * [ms] | - | - | 60 | - | 3–100 | 1–50 |
| Interphase delay * [ms] | - | - | - | - | 0 ms | 0–2 ms |
| Mismatch [%] | - | 4.85 | - | - | - | 1.12 |
| Stimulation method | Charge-balanced biphasic current stimulation | |||||
* Pulse: Biphasic Pulse, ** CIS: CMOS Image Sensor, *** BCD: Bipolar CMOS and Double diffused MOS(DMOS).