In nanofabrication, just as in any other craft, the scale of spatial details is limited by the dimensions of the tool at hand. For example, the smallest details of direct laser writing with far-field light are set by the diffraction limit, which is approximately half of the used wavelength. In this work, we overcome this universal assertion by optically forging graphene ripples that show features with dimensions unlimited by diffraction. Thin sheet elasticity simulations suggest that the scaled-down ripples originate from the interplay between substrate adhesion, in-plane strain, and circular symmetry. The optical forging technique thus offers an accurate way to modify and shape 2D materials and facilitates the creation of controllable nanostructures for plasmonics, resonators, and nano-optics.
In nanofabrication, just as in any other craft, the scale of spatial details is limited by the dimensions of the tool at hand. For example, the smallest details of direct laser writing with far-field light are set by the diffraction limit, which is approximately half of the used wavelength. In this work, we overcome this universal assertion by optically forging graphene ripples that show features with dimensions unlimited by diffraction. Thin sheet elasticity simulations suggest that the scaled-down ripples originate from the interplay between substrate adhesion, in-plane strain, and circular symmetry. The optical forging technique thus offers an accurate way to modify and shape 2D materials and facilitates the creation of controllable nanostructures for plasmonics, resonators, and nano-optics.
One of the central aims in nanoscience
is to be able to modify nanostructures at will. Modifications are
necessary because it is rarely the pristine materials but the modified
and engineered materials that establish functionalities for practical
applications.[1,2] Modifications are particularly
necessary for 2D materials.[3,4] Graphene, for instance,
gains specific functionalities once modified into ribbons,[5,6] introduced with pores or adsorbants,[7−10] or curved into 3D shapes.[11−13]However,
all modification techniques have their limitations. Direct
mechanical manipulation is either slow and accurate,[14] or fast, coarse, and nonreproducible.[15,16] Thermal annealing,[17,18] electron irradiation,[19,20] chemical treatment,[21,22] and Joule heating[23] may be scalable but spatially imprecise due
to their random character. It is particularly challenging to modify
2D materials into customized ripples and other 3D shapes. Such modifications
frequently require dedicated experimental apparatuses[24] or specially prepared substrates.[25] The difficulty for 3D modification lies partly in substrate adhesion.
Although often of weak van der Waals type, adhesion effectively prevents
controlled detachment of 2D membranes from the substrate.Limitations
exist also in optical patterning. Although optical
techniques may be scalable and easy to apply, the spatial details
are determined by the size of the focused laser beam. Creating patterns
with details finer than beam size is just as difficult as scribbling
equations on a piece of paper with a spray can. Still, optical techniques
have plenty of potential for exploration because irradiation provides
various mechanisms to modify 2D materials, depending on laser energy
and ambient atmosphere.[26,27] One particularly promising,
still mostly untapped technique is the so-called optical forging,
which alone enables controlled and on-the-fly 3D shaping of graphene.[28]Given the ubiquity of various limitations,
there is urgency to
improve techniques to modify and engineer 2D materials scalably, accurately,
and preferably in situ, without customized preparations.In
this work, we demonstrate optical forging of graphene into circular
ripples with features much smaller than the size of the laser beam.
By using thin sheet elasticity simulations, the rippling is shown
to arise from the interplay between substrate adhesion, in-plane stress
due to optical forging, and the underlying circular symmetry. Being
based on direct irradiation of graphene without specially prepared
experimental settings, optical forging provides a practical technique
and thereby substantially broadens our abilities to modify and enhance
the functionalities of graphene and maybe even other 2D materials.To prepare the sample, we grew single-layer graphene by chemical
vapor deposition (CVD) on a Cu substrate[29] and transferred it to thermally grown SiO2. For fabrication
details and graphene characterization, see the Supporting Information (SI).Selected points in the
sample were then irradiated by a 515 nm
femtosecond laser focused with an objective lens (N.A. of 0.8) to
a single Gaussian spot. To prevent photoinduced oxidation during the
irradiation, the sample was installed inside a closed chamber purged
with N2.[27] The laser produced
250 fs pulses at 5–25 pJ/pulse energy and 600 kHz repetition
rate for a tunable irradiation time τ. This process is called
optical forging and results in blistering of the graphene membrane
(Figure a and Movie
1 in the SI). Blistering occurs due to
local expansion of the membrane, caused by laser-induced defects and
the related compressive in-plane stress.[28] The local expansion field ε() therefore depends on the time-integrated laser intensity profile I(), which enables accurate
control over the expansion and blister height via the irradiation
time τ. Consequently, we irradiated the sample at separate spots
for irradiation times ranging from τ = 0.1 to 3600 s. Finally,
the blistered sample was characterized by Raman spectroscopy and measured
by an atomic force microscope (AFM; see the SI).
Figure 1
Monitoring the gradual formation of optically forged graphene blisters
on SiO2. (a) In optical forging, graphene is irradiated
by focused femtosecond laser beam under an inert N2 atmosphere.
The laser creates defects that cause isotropic expansion of graphene
membrane and trigger the formation of blisters. The blisters are hollow
and not pressurized.[28] (b) Atomic force
microscope image of blisters formed at progressively increasing irradiation
time τ (numbers show τ in seconds; highest features are
60 nm). Blisters form at τ > 0.4 s, initially with one circular
ripple, later with several ripples and a dome in the center. (c) Zoom
into an irradiated area with τ = 0.2 s, where the graphene still
remains flat. Visible are only the patchy residues from sample processing.
(d) Zoom into a blister with one ripple (τ = 1 s). (e) Zoom
into a blister with multiple ripples (τ = 50 s). Scale bars,
1 μm.
Monitoring the gradual formation of optically forged graphene blisters
on SiO2. (a) In optical forging, graphene is irradiated
by focused femtosecond laser beam under an inert N2 atmosphere.
The laser creates defects that cause isotropic expansion of graphene
membrane and trigger the formation of blisters. The blisters are hollow
and not pressurized.[28] (b) Atomic force
microscope image of blisters formed at progressively increasing irradiation
time τ (numbers show τ in seconds; highest features are
60 nm). Blisters form at τ > 0.4 s, initially with one circular
ripple, later with several ripples and a dome in the center. (c) Zoom
into an irradiated area with τ = 0.2 s, where the graphene still
remains flat. Visible are only the patchy residues from sample processing.
(d) Zoom into a blister with one ripple (τ = 1 s). (e) Zoom
into a blister with multiple ripples (τ = 50 s). Scale bars,
1 μm.The systematic increase
in irradiation time produced a nontrivial
but beautiful and reproducible pattern of blisters (Figure b and Figure S4). In particular, blisters had profiles more complex than
the usual domes.[30] At short irradiation
times (τ < 0.4 s) the graphene remained flat on the substrate
(Figure c). At intermediate
irradiation times (0.4 ≤ τ ≤ 2 s), the graphene
developed blisters with one circular ripple (Figure d). At long irradiation times (τ ≥
5 s) the graphene developed concentric ripples in progressively increasing
numbers and a gradually developing central dome (Figure e and Movie 2 in the SI). Parts of the area between the blisters were
detached from the substrate because the laser irradiated also during
the movement from one spot to another. Note that the radial features
in the ripples have dimensions down to 100 nm, nearly 10 times smaller
than the laser spot and the ripple diameters themselves. Optical forging
can thus reach 3D shaping of graphene that beats the diffraction limit.
This is our main result.To quantify the expansion of the graphene
membrane, we used AFM
height profiles to measure the increase in the surface area of the
blisters. Within the projected areas of ∼1 μm2, the corrugated membrane areas increase nearly monotonously upon
increasing irradiation time, reaching 10–2 μm2 (∼1%) area increase at τ = 1 h (Figure a). Initially, the area increases
linearly in irradiation time, at rate 22 nm2/s (Figure b). This area increase
was used to determine radius-dependent linear expansion, ε(r). By assuming here a one-photon process and a Gaussian
laser intensity profile I(r), we
obtainwhere r = 0 at the
center
of the spot and fwhm = 800 nm is the full width at half-maximum of
the laser beam. Because the laser focal spot was difficult to maintain,
fwhm had to be treated as a parameter and adjusted to give the best
overall fit to the observed lateral dimensions in the experiment.
The maximal expansion ε0 increases at the rate 1.5
× 10–3 %/s at short irradiation times and saturates
at almost 1% at long irradiation times (Figure ). The initial linear rate and the saturation
are in good agreement with previous experiments.[28]
Figure 2
Effective expansion of graphene membrane during laser irradiation.
(a) Area increase due to blister formation, as measured from the blister
profiles of Figure b (right scale). Area increase transformed into maximum linear expansion
in the middle of the laser spot (left scale). (b) Zoom into τ
< 150 s. A linear fit gives an expansion rate 1.5 × 10–3 %/s or 22 nm2/s (dashed line). The vertical
bars are uncertainties in blister areas.
Effective expansion of graphene membrane during laser irradiation.
(a) Area increase due to blister formation, as measured from the blister
profiles of Figure b (right scale). Area increase transformed into maximum linear expansion
in the middle of the laser spot (left scale). (b) Zoom into τ
< 150 s. A linear fit gives an expansion rate 1.5 × 10–3 %/s or 22 nm2/s (dashed line). The vertical
bars are uncertainties in blister areas.The diffraction-unlimited rippling suggests a mechanism that
involves
competition between surface adhesion and expansion-induced stress.
To investigate the mechanism in detail, we simulate blister growth
by classical thin sheet elasticity model.[31] Such models have proven successful in the modeling of deformed graphene
membranes.[16,32−36] The energy in the model contains in-plane strain
energy, out-of-plane bending energy, and surface adhesion. The laser-induced
isotropic expansion is introduced via the diagonal of the in-plane
strain tensor as e() = e0() –
δε(), where ε() is the expansion field and e0() is the strain tensor of the unexpanded,
pristine graphene.[28] The adhesion is modeled
by the generic 12–6 Lennard-Jones potential.[37] This model was discretized, implemented in two computer
codes (with and without circular symmetry), and used to optimize blister
geometries for given ε0 and adhesion energy εadh.[38] For details, see the SI.Before analyzing the model in full,
it is instructive first to
ignore adhesion and calculate a few analytical results. Because of
the smallness of the graphene bending modulus, on micrometer-length
scales the mechanical behavior is dominated by in-plane strain energy.[39] The strain energy is minimized when e ≈ 0 or e0 ≈ δε(). To a first approximation, eq then implies an area increase
of ΔA = [π/(2 log 2)] × fwhm2ε0. (This relation was previously used to
transform ΔA into ε0.) With
the displacement vector a⃗(r) = a(r)r̂ + a(r)ẑ, the diagonal
components of the strain tensor becomewhere r refers to radial
and t refers to tangential in-plane component, and
prime stands for a derivative with respect to r.
Because the in-plane strain energy minimizes at e ≈ 0, we obtain a(r) ≈ rε(r) andThat is, when the
membrane adapts to isotropic
expansion under radial symmetry, energy gets minimized by adjusting
the slope into a fixed absolue value. When the slope is negative for all r, integration yields the profile . This profile corresponds
to a blister
with one central dome and a maximum height of . The numerically optimized blister profile
follows this analytical estimate accurately (Figure a).
Figure 3
Thin sheet elasticity modeling of blisters with
ε0 = 0.017% and εadh = 0 (no substrate
adhesion).
(a) Blister with one central dome. (b) Blister with one circular ripple.
(c) Blister with two concentric ripples and a central dome. Panels
show visualizations (left; height exaggerated), radial height profiles a(r) (middle),
and the slopes of the radial height profiles a′(r) (right). Dashed
lines on the right show the analytical limits for a′(r) from eq .
Thin sheet elasticity modeling of blisters with
ε0 = 0.017% and εadh = 0 (no substrate
adhesion).
(a) Blister with one central dome. (b) Blister with one circular ripple.
(c) Blister with two concentric ripples and a central dome. Panels
show visualizations (left; height exaggerated), radial height profiles a(r) (middle),
and the slopes of the radial height profiles a′(r) (right). Dashed
lines on the right show the analytical limits for a′(r) from eq .However, positive and negative slopes in eq are equally acceptable. Because
the energy
cost of bending is small, it is cheap to create a kink that reverses
the sign of a′(r) abruptly. This kink appears topologically as a perfectly
round ripple (Figure b). Multiple kinks at different radii produce concentric ripples
of varying heights and diameters (Figure c). Compared with the scale of in-plane strain
energy, blisters of different ripple counts are nearly isoenergetic.
When the number of ripples increases, the slopes progressively deviate
from eq . Otherwise,
the analytical description of the blister profiles without adhesion
is apparent.The role of adhesion, then, is to pull the membrane
down, toward
the substrate. Understanding the behavior of adhesion-free membranes
is helpful, but when elastic and adhesive energies compete, we have
to rely on numerical simulations. We took a closer look at the blister
with τ = 1 s, which is near the onset of blistering (Figure d). This 4 nm high
blister has a 0.97 μm ripple diameter and ε0 = 0.017% expansion, as given by the AFM profile. We simulated this
blister using the experimental ε0 and adhesion in
the range εadh = 0...1 eV/nm2.When
εadh < 1 μeV/nm2, the
ripple is broad and the middle of the blister is mostly detached from
the substrate, disagreeing with the experiment (Figure a); adhesion remains a minor perturbation
to the zero-adhesion profile (Figure b). When εadh > 10 μeV/nm2, in turn, the ripple becomes too narrow and shallow, also
disagreeing with the experiment; when εadh ≳
100 μeV/nm2, the membrane ultimately snaps flat on
the substrate. However, around εadh ≈ 3 μeV/nm2, adhesion pulls the membrane down so that both the ripple
width and height agree with the experiment. Using the adhesion εadh = 3 μeV/nm2, one-ripple blistering occurs
at ε0 ≈ 0.005%, and the blister height increases
linearly when ε0 further increases (Figure b). This simulated trend agrees
with the experimental trend in one-ripple blisters (τ ≲
2 s). These agreements suggest that the adhesion between laser-modified
graphene and SiO2 is observable but substantially smaller
than typically observed for pristine van der Waals solids and clean
interfaces.[40]
Figure 4
Thin sheet elasticity
modeling of blisters with adhesion. (a) Experimental
profile of τ = 1 s blister (black curve) compared with simulated
profiles of one-ripple blisters with different adhesions (blue curves
from top to bottom: εadh = 0, 0.5, 1.0, 3.0, 10,
and 100 μeV/nm2). (b) Height of one-ripple blister
as a function of expansion ε0. (c) Contour plot of
a one-ripple blister with ε0 = 0.017% (corresponding
to τ = 1 s, Figure d). (d) Contour plot of a multiple-ripple blister with ε0 = 0.09% (corresponding to τ = 50 s, Figure e). (e) Contour plot of ε(r)/ε0 for all blisters. The color scale
is linear from zero to one. (f) Contour plots for all energy-optimized
blisters, using the expansions from Figure b and the initial guesses from Figure b. Scale bar, 1 μm. Field
of view in panels c–e is 2.2 × 2.2 μm2. Panels b–f have εadh = 3 μeV/nm2, and all blisters are optimized without imposing radial symmetry.
Thin sheet elasticity
modeling of blisters with adhesion. (a) Experimental
profile of τ = 1 s blister (black curve) compared with simulated
profiles of one-ripple blisters with different adhesions (blue curves
from top to bottom: εadh = 0, 0.5, 1.0, 3.0, 10,
and 100 μeV/nm2). (b) Height of one-ripple blister
as a function of expansion ε0. (c) Contour plot of
a one-ripple blister with ε0 = 0.017% (corresponding
to τ = 1 s, Figure d). (d) Contour plot of a multiple-ripple blister with ε0 = 0.09% (corresponding to τ = 50 s, Figure e). (e) Contour plot of ε(r)/ε0 for all blisters. The color scale
is linear from zero to one. (f) Contour plots for all energy-optimized
blisters, using the expansions from Figure b and the initial guesses from Figure b. Scale bar, 1 μm. Field
of view in panels c–e is 2.2 × 2.2 μm2. Panels b–f have εadh = 3 μeV/nm2, and all blisters are optimized without imposing radial symmetry.For completeness, we optimized
all 18 blisters by using εadh = 3 μeV/nm2 and by adopting the observed
set of ripples as initial guesses. After optimization, the resulting
pattern of blisters turned out similar to the experimental ones (Figure f). At small ε0, stable blisters have only one ripple (Figure c), but at larger ε0, stable
blisters have multiple ripples (Figure d). Simulations capture the main features of the experimental
blisters, even if they deviate with respect to certain details, presumably
due to the asymmetric expansion field and small variations in the
initial conditions of the graphene membrane, generated during the
sample fabrication.Yet a question remains: Why do blisters
initially appear with one
circular ripple? This question can be addressed by considering eq . The preferred slope has
a maximum at = 0.48 μm. In other words, around
radius r0, the energy to keep the membrane
flat is the largest. When the in-plane stress in a flat membrane increases
upon increasing ε0, it becomes energetically favorable
to release the stress by creating the kink right at r0 and making a circular ripple with diameter 2r0 = 0.96 μm. This result agrees well with
the observations. Upon continuous irradiation, after the initial ripple
has appeared, the ripple height increases until it becomes energetically
favorable to create more ripples. This implies a process-dependent
rippling of ever-increasing complexity.This scenario for rippling
was confirmed by performing global optimizations
for blisters with εadh = 0.1–100 μeV/nm2, ε0 = 0.001...1%, and various types of initial
guesses. First, at sufficiently small ε0, the membrane
remains flat without blistering. A critical limit for blistering is
around ε0c ≈ 0.02 × (εadh/eV nm–2)1/2. Second, when ε0 increases just
above the critical limit, the first blisters always have one ripple
with diameter D0 ≈ 1 μm,
independent of εadh. This result is in agreement
with the experiments and with the maximum-slope argument given above
(D0 ≈ 2r0). Third, at intermediate values of ε0, blisters
show a complex pattern of ripples of varying heights and diameters.
Fourth, at the limit of large ε0, the in-plane strain
energy dominates, and the minimum energy blisters always have one
central dome (Figure a).Compared with the typical magnitude of adhesion (1 to 2
eV/nm2) between clean interfaces of van der Waals solids,[40−43] the adhesion in the model (∼1 μeV/nm2) is
small. The smallness, however, is apparent even in a back-of-the-envelope
calculation. Namely, upon blistering, the gain in elastic energy density
is ksε02/(1 – ν), and the cost of
adhesion energy density is εadh. At the onset of
blistering, the two energies are equal, εadh ≈ ksε02/(1 – ν). Because the blisters
appear at ε0 ≈ 0.02%, the adhesion has to
be around 1–10 μeV/nm2. The small adhesion
may be due to water or functional groups,[44] topographic corrections,[45] electrostatics
due to localized charge traps,[46] or other
experimental details.[47,48] A detailed investigation of the
laser-modified adhesion will be pursued later.To summarize,
by using the optical forging technique, we created
diffraction-unlimited circular ripples in graphene on SiO2. The rippling could be explained by the presence of circular symmetry
amid the competition between substrate adhesion and in-plane compressive
stress. In other words, the tiny rippling results spontaneously after
creating an inhomogeneous expansion field on a much larger length
scale. We can therefore straightforwardly predict that upon shrinking
the size of the laser beam, the ripples will get smaller still. Once
the mechanism responsible for the expansion of graphene is understood
better, the technique could also be applied to other substrates and
2D materials. However, already now the technique and our observations
provide many openings for novel research. A straightforward extension
will be to control the rippling by engineering beam shapes. The technique
produces beautiful circular blisters that probably have well-defined
vibrational frequencies and can be used in resonators.[49] Via the formation of circular ripples, the technique
also produced controllable curvatures that can be used to launch localized
plasmons.[50] Thus, in addition to producing
new physics and posing fundamental questions such as that of the laser-modified
adhesion, the technique opens new avenues in the research of 2D materials.
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