| Literature DB >> 30231566 |
Monika Kwoka1, Barbara Lyson-Sypien2, Anna Kulis3, Dario Zappa4, Elisabetta Comini5.
Abstract
The surface chemistry and the morphology of SnO₂ nanowires of average length and diameter of several µm and around 100 nm, respectively, deposited by vapor phase deposition (VPD) method on Au-covered Si substrate, were studied before and after subsequent air exposure. For this purpose, surface-sensitive methods, including X-ray photoelectron spectroscopy (XPS), thermal desorption spectroscopy (TDS) and the scanning electron microscopy (SEM), were applied. The studies presented within this paper allowed to determine their surface non-stoichiometry combined with the presence of carbon contaminations, in a good correlation with their surface morphology. The relative concentrations of the main components [O]/[Sn]; [C]/[Sn]; [Au]/[Sn], together with the O⁻Sn; O⁻Si bonds, were analyzed. The results of TDS remained in a good agreement with the observations from XPS. Moreover, conclusions obtained for SnO₂ nanowires deposited with the use of Au catalyst were compared to the previous obtained for Ag-assisted tin dioxide nanowires. The information obtained within these studies is of a great importance for the potential application of SnO₂ nanowires in the field of novel chemical nanosensor devices, since the results can provide an interpretation of how aging effects influence gas sensor dynamic characteristics.Entities:
Keywords: surface chemistry; surface morphology; tin dioxide SnO2 nanowires; vapor phase deposition
Year: 2018 PMID: 30231566 PMCID: PMC6164749 DOI: 10.3390/nano8090738
Source DB: PubMed Journal: Nanomaterials (Basel) ISSN: 2079-4991 Impact factor: 5.076
Figure 1The scanning electron microscopy (SEM) images (in two scales (a) 1 µm and (b) 100 nm) of vapor phase deposition (VPD) SnO2 nanowires deposited on Au-covered Si (100) substrate.
Figure 2X-ray photoelectron spectroscopy (XPS) survey spectra with main core level lines of the VPD SnO2 nanowires deposited on Au-covered Si substrate before and after the programmable linear growth of the sample temperature (TPD) process.
Figure 3XPS spectral window of: (a) O1s and Sn3d, (b) Si2p, Au4f, and Sn4d of the VPD SnO2 nanowires deposited on Au-covered Si (100) substrate before and after the subsequent thermal desorption spectroscopy (TDS) experiment.
The relative atomic ratios of basic elements for VPD SnO2 nanowires deposited on Au-covered Si (100) substrate.
| Sample Status | Relative Concentration | ||
|---|---|---|---|
| [O]/[Sn] | [C]/[Sn] | [Au]/[Sn] | |
|
| 2.26 ± 0.05 | 2.66 ± 0.05 | 0.11 ± 0.05 |
|
| 1.84 ± 0.05 | 0.54 ± 0.05 | 0.11 ± 0.05 |
Figure 4Registered XPS Sn3d5/2 and O1s peaks, and deconvoluted components of the air-exposed VPD SnO2 nanowires: (a,b) before TDS; (c,d) after the TDS process.
The basic parameters of XPS Sn3d5/2 and O1s peaks used in the deconvolution procedure and the obtained contribution of the main components for the samples both before as well as after TDS.
| Before TDS | After TDS | |||||
|---|---|---|---|---|---|---|
|
| Sn3d5/2 | O1s | Sn3d5/2 | O1s | ||
|
| Sn4+ | O–Sn4+ | O–Si4+ | Sn4 | O–Sn4+ | O–Si4+ |
|
| 486.9 | 531.0 | 532.9 | 487.3 | 531.2 | 533.1 |
|
| 1.0 | 0.66 | 0.34 | 1.0 | 0.63 | 0.37 |
Figure 5TDS spectra of the main residual gases desorbed from the VPD SnO2 nanowires deposited on an Au-covered Si substrate.