| Literature DB >> 30158451 |
Marina Rumyantseva1, Abulkosim Nasriddinov2, Svetlana Vladimirova3, Sergey Tokarev4,5, Olga Fedorova6,7, Ivan Krylov8, Konstantin Drozdov9, Alexander Baranchikov10,11, Alexander Gaskov12.
Abstract
In this work, the hybrids based on nanocrystallineEntities:
Keywords: NO2; Ru(II) complex; indium oxide; organic–inorganic hybrid materials; semiconductor gas sensor; tin dioxide; visible light activation
Year: 2018 PMID: 30158451 PMCID: PMC6164473 DOI: 10.3390/nano8090671
Source DB: PubMed Journal: Nanomaterials (Basel) ISSN: 2079-4991 Impact factor: 5.076
Figure 1XRD patterns of SnO2 (a) and In2O3 (b) samples.
Figure 2SEM images of In2O3 (a) and SnO2 (b) thick films deposited on functional substrates (see Materials and Methods) and sintered at 300 °C.
Figure 3Structure and optical absorption spectrum of Ru-TT complex in a 5 × 10−5 M methanol solution.
Electrochemical data and calculated values of HOMO and LUMO of Ru-TT complex.
| −1.27/−1.21 | 1.23 | −6.15 | −3.46 |
| −1.48/−1.41 | 1.42 | ||
| −1.96/−1.84 | 1.52 |
Figure 4Optical images of SnO2 thick films deposited on functional substrates (see Materials and Methods) before (a) and after (b) sensitization with the Ru-TT complex. EDX maps of element distribution on the surface of In2O3 Ru-TT (c) and SnO2 Ru-TT (d) thick films.
Microstructure characteristics, composition and photoresponse of investigated samples.
| Sample | dXRD a, nm | dTEM b, nm | Ssurf c, m2/g |
| SPh
e in Pure Air |
|---|---|---|---|---|---|
| SnO2 | 4 ± 1 | 4 ± 1 | 110 ± 5 | - | 1.00 |
| SnO2 Ru-TT | 1.4 ± 0.1 | 2.72 | |||
| In2O3 | 7 ± 1 | 7 ± 2 | 60 ± 5 | - | 1.30 |
| In2O3 Ru-TT | 2.1 ± 0.2 | 3.15 |
a MOx crystallite size, estimated from XRD data; b MOx particle size (TEM); c MOx specific surface area; d obtained by EDX on thick films: M = Sn for the SnO2 Ru-TT sample; M = In for the In2O3 Ru-TT sample; e Effective photoresponse.
Figure 5TG, DSC and MS curves of the SnO2 Ru-TT hybrid sample.
Figure 6Absorption spectra of the pure semiconductor oxide (1), Ru-TT complex (2), hybrid sample (3) and spectral dependences of photoconductivity (4) of In2O3 Ru-TT (a) and SnO2 Ru-TT (b).
Figure 7Scheme of resistance change of n-type semiconductor under periodic illumination.
Figure 8(a) Scheme of the consequential mechanism for the generation of holes in pure nanocrystalline oxides under visible light illumination. E—valence band, E—conduction band, L—acceptor level. (b) Scheme of the mutual arrangement of the energy levels for bulk In2O3, SnO2, and HOMO and LUMO of the Ru-TT complex.
Figure 9Room-temperature electrical resistances of (a) In2O3, (b) In2O3 Ru-TT, (c) SnO2, and (d) SnO2 Ru-TT samples under periodic illumination, depending on NO2 content in the gas phase. (1): blue light (λmax = 470 nm), (2): green light (λmax = 535 nm), (3): red light (λmax = 630 nm). The digits on Figure 9a show the sequence of changes in NO2 concentration (ppm). (e) Room-temperature electrical resistance of the In2O3 Ru-TT sample in the presence of the 0.5-ppm NO2 concentration under periodic blue light (λmax = 470 nm) illumination. The shaded areas correspond to the “light on” period.
Figure 10Effective room-temperature photoresponse (a) and sensor signal (b) of In2O3- and SnO2-based samples under periodic visible light illumination, depending on NO2 content in the gas phase. Open symbols: data for blank matrixes, filed symbols: data for hybrid materials. (1): blue light (λmax = 470 nm), (2): green light (λmax = 535 nm), (3): red light (λmax = 630 nm).
Figure 11Scheme of the synthesis of Ru-TT complex.
Figure 12Optical image (top view) of the Al2O3 substrate with Pt electrodes. The Pt heather is on the back side (not shown).