| Literature DB >> 30065623 |
Youjoung Kim1,2, Seth M Meade1,2, Keying Chen1,2, He Feng1,2, Jacob Rayyan1,2, Allison Hess-Dunning1,2, Evon S Ereifej1,2.
Abstract
Intracortical microelectrodes (IME) are neural devices that initially were designed to function as neuroscience tools to enable researchers to understand the nervous system. Over the years, technology that aids interfacing with the nervous system has allowed the ability to treat patients with a wide range of neurological injuries and diseases. Despite the substantial success that has been demonstrated using IME in neural interface applications, these implants eventually fail due to loss of quality recording signals. Recent strategies to improve interfacing with the nervous system have been inspired by methods that mimic the native tissue. This review focusses on one strategy in particular, nano-architecture, a term we introduce that encompasses the approach of roughening the surface of the implant. Various nano-architecture approaches have been hypothesized to improve the biocompatibility of IMEs, enhance the recording quality, and increase the longevity of the implant. This review will begin by introducing IME technology and discuss the challenges facing the clinical deployment of IME technology. The biological inspiration of nano-architecture approaches will be explained as well as leading fabrication methods used to create nano-architecture and their limitations. A review of the effects of nano-architecture surfaces on neural cells will be examined, depicting the various cellular responses to these modified surfaces in both in vitro and pre-clinical models. The proposed mechanism elucidating the ability of nano-architectures to influence cellular phenotype will be considered. Finally, the frontiers of next generation nano-architecture IMEs will be identified, with perspective given on the future impact of this interfacing approach.Entities:
Keywords: intracortical microelectrodes; mechanotransduction; nano-architecture; neuroinflammation; topography
Year: 2018 PMID: 30065623 PMCID: PMC6056633 DOI: 10.3389/fnins.2018.00456
Source DB: PubMed Journal: Front Neurosci ISSN: 1662-453X Impact factor: 4.677
Summary of different nano-architecture fabrication techniques.
| Nano-architecture technique | Compatible materials | Resolution | time required | Cost | Serial or batch processing | Features | References |
|---|---|---|---|---|---|---|---|
| Electron beam lithography | Silicon and conductive materials. Requires electron-sensitive resist (i.e., PMMA) | Below 10 nm | Slow for scanning focused electron beam | High-equipment cost (>$1 million) | Serial for focused electron beam; batch processing possible for projection electron beam lithography; device-scale or wafer-scale | Often used to create master mold for nano-imprint lithography | |
| Nano-imprint lithography | Silicon-based materials, metals, polymers | 2–100 nm | Relatively fast to transfer pattern from mold to resist | High cost of master mold, but overall cost is relatively low due to reusability of mold | Batch processing; device-scale or wafer-scale | Two broad categories: thermal NIL and ultraviolet NIL | |
| Focused ion beam lithography | Silicon-based materials, metals, and polymers | ∼20 nm | Slow rate of milling | High-equipment cost (>$1 million) | Serial processing on device-scale | Direct write; flexible design and materials |
Highlights of selected studies implanting nano-architecture neural probes.
| Nano-architechture method | Material | Nano-architechture location | Nano-architechture specifications | Outcomes | Reference |
|---|---|---|---|---|---|
| Ion-beam assisted deposition (IBAD) anodic stain etching | Porous silicon thin-film around a ceramic electrode | Whole electrode | 1 μm–100 nm sized pores (non-uniform distribution) | Enhanced neurite outgrowth while at the same time decreased astrocyte adhesion | |
| Focused gallium ion beam | Silicon | Whole electrode | Parallel grooves 200 nm wide spaced 200 nm apart, 200 nm deep | Increase neuron density 150 μm from the electrode and decreased gene expression of proinflammatory and oxidative stress associated genes at 4 weeks | |
| Low-pressure chemical vapour deposition (LPCVD) and photolithography | Black poly-silicon and silicon | Whole electrode | 520–800 nm long nano-pillars, diameter of 150–200 nm | Increased neuronal viability near the electrode at 8 weeks | |
| Anodization | Indium titanium oxide (ITO) | Whole electrode | Nanoparticles mean diameter 89 nm (random distribution) | Significant decrease of microglia and reactive astrocytes and increase of neurons. Downregulations in cleaved spectrin, a key astrocytic activation protein | |
| Electrospining pedot | Pedot | Contacts | 500 nm diameter fibers randomly oriented | Decreased impedance and increased SNR after 7 weeks |