| Literature DB >> 29942035 |
Cosmin Romanitan1,2, Pericle Varasteanu1,2, Iuliana Mihalache1, Daniela Culita3, Simona Somacescu3, Razvan Pascu1, Eugenia Tanasa1,4, Sandra A V Eremia5, Adina Boldeiu1, Monica Simion1, Antonio Radoi6, Mihaela Kusko7.
Abstract
The challenge for conformal modification of the ultra-high internal surface of nanoporous silicon was tackled by electrochemical polymerisation of 2,6-dihydroxynaphthalene using cyclic voltammetry or potentiometry and, notably, after the thermal treatment (800 °C, N2, 4 h) an assembly of interconnected networks of graphene strongly adhering to nanoporous silicon matrix resulted. Herein we demonstrate the achievement of an easy scalable technology for solid state supercapacitors on silicon, with excellent electrochemical properties. Accordingly, our symmetric supercapacitors (SSC) showed remarkable performance characteristics, comparable to many of the best high-power and/or high-energy carbon-based supercapacitors, their figures of merit matching under battery-like supercapacitor behaviour. Furthermore, the devices displayed high specific capacity values along with enhanced capacity retention even at ultra-high rates for voltage sweep, 5 V/s, or discharge current density, 100 A/g, respectively. The cycling stability tests performed at relatively high discharge current density of 10 A/g indicated good capacity retention, with a superior performance demonstrated for the electrodes obtained under cyclic voltammetry approach, which may be ascribed on the one hand to a better coverage of the porous silicon substrate and, on the other hand, to an improved resilience of the hybrid electrode to pore clogging.Entities:
Year: 2018 PMID: 29942035 PMCID: PMC6018509 DOI: 10.1038/s41598-018-28049-x
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1HR-SEM plan view images of modified porous silicon layer, corresponding to NC_ J (a) and NC_CV (b) electrodes, respectively (cross-section detail – inset image); HR-TEM images of micropores for structure NC_ J (c) and structure NC_CV (d), respectively; upper inset: the corresponding SAED pattern.
Figure 2X-ray diffraction analyses: (a) θ/2θ wide angle X-ray diffraction; (b) 2θ/ω scans for (004) Bragg reflections; (c) small angle X-ray scattering; and (d) N2 adsorption/desorption isotherms for NC_CV and NC_ J samples in comparison with p-Si substrate.
Textural parameters of NC_CV, NC_ J and p-Si substrate.
| Sample | kp (Å−2) | Q (Å−3) | SSAXS (m2g−1) | rXRD (nm) | SBET (m2g−1) | Smicro* (m2g−1) | Vtotal (cm3g−1) | rBET (nm) |
|---|---|---|---|---|---|---|---|---|
|
| 6.15 | 473 | 141.46 | 6.0 | 100.9 | 4.1 | 0.178 | 5.4 |
|
| 6.09 | 530 | 125.01 | 6.1 | 99.3 | 4.8 | 0.177 | 5.7 |
|
| 1.01 | 55 | 199.79 | 5.8 | 115.5 | 6.4 | 0.167 | 4.6 |
*The micropore surface area was determined via t-plot analysis.
Figure 3Cyclic voltammograms at different scan rates ranging from 5 to 5000 mV/s for NC_CV-SSC (a) and NC_ J-SSC (b) devices; (c) Comparative CV curves obtained at scan rates of 50 mV/s with respect to reference p-Si-SSC; (d) Variation of SSC specific capacitance with the scan rate.
Figure 4Charge discharge curves measured over the potential window of −0.9–1.2 V at different current densities ranging from 0.5 to 100 A/g for NC_CV-SSC (a) and NC_ J-SSC (b) devices; (c) Comparative of the charge-discharge profiles measured at a constant current density of 0.5 A/g; (d) Variation of the specific capacitance with the current densities.
Figure 5Electrochemical impedance spectroscopy measurements for NC_CV-SSC and NC_ J-SSC devices: (a) Nyquist plots (inset: high frequency detail plots); (b) Bode phase angle plots as function of frequency; (c) variation of capacitance (CEIS) with frequency – normalized and absolute (inset) values; (d) variation of imaginary capacitance (C”) with frequency – normalized and absolute (inset) values.
Figure 6Ragone plots for NC_CV-SSC and NC_ J-SSC devices.
Figure 7(a) Cycling stability at current density of 10 A/g. Comparative Nyquist plots recorded before (b) and after (c) 1000 cycles.