| Literature DB >> 29446777 |
Abhijeet L Sangle1, Oon Jew Lee, Ahmed Kursumovic, Wenrui Zhang, Aiping Chen, Haiyan Wang, Judith L MacManus-Driscoll.
Abstract
We report on nanoengineered SrTiO3-Sm2O3 nanocomposite thin films with the highest reported values of commutation quality factor (CQF or K-factor) of >2800 in SrTiO3 at room temperature. The films also had a large tunability of dielectric constant (49%), low tangent loss (tan δ = 0.01) and a Curie temperature for SrTiO3 > 300 °C, making them very attractive for tunable RF applications. The enhanced properties originate from the unique nanostructure in the films, with <20 nm diameter strain-controlling Sm2O3 nanocolumns embedded in a SrTiO3 matrix. Very large out-of-plane strains (up to 2.6%) and high tetragonality (c/a) (up to 1.013) were induced in the SrTiO3. The K-factor was further enhanced by adding 1 at% Sc3+ (acceptor) dopant in SrTiO3 to a value of 3300 with the tangent loss being ≤0.01 up to 1000 kV cm-1.Entities:
Year: 2018 PMID: 29446777 PMCID: PMC5815283 DOI: 10.1039/c7nr06991j
Source DB: PubMed Journal: Nanoscale ISSN: 2040-3364 Impact factor: 7.790
Fig. 1(a) Cross-section and (b) plan-view STEM of a ∼300 nm thick SrTiO3–Sm2O3 (30–70 wt%) film grown on SrRuO3/SrTiO3, showing vertical Sm2O3 nanocolumns embedded in SrTiO3 (STO) film matrix. (c) Reciprocal space map around the STO (113) substrate peak showing that the STO film is strained out-of-plane as evidenced by the lower Q value of the (113) STO film peak, (d) AFM image showing smooth film surface.
Fig. 2(a) The variation of out-of-plane (c) and in-plane (a) lattice parameters of SrTiO3 as well as tetragonality (c/a ratio); (b)–(d) shows dielectric properties of ∼250 nm thick films grown on SrRuO3/SrTiO3. (b) Dependence of tunability at 400 kV cm–1 and loss tangent (at 0 kV cm–1) on Sm2O3 content in the films; (c) relative permittivity (εr) and tan δ vs. Electric field data for films of 60 wt% Sm2O3; (d) dependence of commutation quality factor (K-factor) for an electric field of 500 kV cm–1 on Sm2O3 content in the films. [Note: The tunability, tangent loss and K-factor for Sm2O3 wt% of 0 and 100 were calculated for 80 kV cm–1 electric field].
Fig. 3Ferroelectric properties of ∼250 nm STO films with 60 wt% Sm2O3 addition grown on Nb-STO substrates. (a) Room temperature polarisation (P) vs. electric field (E) hysteresis loops (PE loops) at different frequencies; (b) relative permittivity (εr) and tan δ vs. electric field (E) behaviour; (c) temperature dependence of relative permittivity (εr) and (d) temperature dependence of the dielectric loss (tan δ).
Fig. 4Electrical characterisation results of 250 nm thick, 1 mol% Sc3+ doped SrTiO3–Sm2O3 (60 wt% Sm2O3) film grown on Nb–SrTiO3 substrate. (a) Room temperature polarisation (P) vs. electric field (E) hysteresis measurements performed at different frequencies, (b) and (c) relative permittivity (εr) and tan δ vs. electric field measurements at 500 kV cm–1 and 1000 kV cm–1, respectively.
Comparison of tunable microwave performance of the devices studied in this work with some of the best data from the literature (η is the tunability as defined before)
| Device | Tunable high frequency performance ( | Frequency | Ref. |
| SrTiO3–Sm2O3 columnar composite films |
| Measured at 1 MHz and room temperature | This work |
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| (1 at%) Sc-doped SrTiO3–Sm2O3 columnar composite films |
| Measured at 1 MHz and room temperature | This work |
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| SrTiO3 thin film, molecular beam epitaxy (MBE) grown |
| Measured at 10 GHz and room temperature |
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| Ba(1– |
| Measured at 1 MHz and room temperature |
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| Ba(1– |
| Measured at 1 MHz and room temperature |
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| Mn-doped Pb(1– |
| Measured at 100 kHz at room temperature |
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| Ba(1– |
| Measured at 1 MHz and room temperature |
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| Ba(1– |
| Measured at 1 MHz and room temperature |
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| Bi1.5ZnNb1.5O7 – Mn-doped Ba(1– |
| Measured at 100 kHz and room temperature |
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Growth conditions explored for growth of heteroepitaxial (Sc-doped) SrTiO3–Sm2O3 nanocomposite films
| Parameter | Value |
| Deposition temperature | 750–800 °C |
| Oxygen gas pressure during the deposition | 0.2 mbar |
| Laser fluence | ∼2.05 mJ cm–2 |
| Laser pulse frequency | 1 Hz |
| Deposition time | 25 minutes for (∼250 nm thick films) |
| Post-annealing conditions | 650 °C, 400 mbar O2 partial pressure and annealing time of 60 minutes |