| Literature DB >> 29375962 |
Julianna Panidi1, Alexandra F Paterson1, Dongyoon Khim1, Zhuping Fei2, Yang Han2, Leonidas Tsetseris3, George Vourlias4, Panos A Patsalas4, Martin Heeney2, Thomas D Anthopoulos1,5.
Abstract
Improving the charge carrier mobility of solution-processable organic semiconductors is critical for the development of advanced organic thin-film transistors and their application in the emerging sector of printed electronics. Here, a simple method is reported for enhancing the hole mobility in a wide range of organic semiconductors, including small-molecules, polymers, and small-molecule:polymer blends, with the latter systems exhibiting the highest mobility. The method is simple and relies on admixing of the molecular Lewis acid B(C6F5)3 in the semiconductor formulation prior to solution deposition. Two prototypical semiconductors where B(C6F5)3 is shown to have a remarkable impact are the blends of 2,8-difluoro-5,11-bis(triethylsilylethynyl)anthradithiophene:poly(triarylamine) (diF-TESADT:PTAA) and 2,7-dioctyl[1]-benzothieno[3,2-b][1]benzothiophene:poly(indacenodithiophene-co-benzothiadiazole) (C8-BTBT:C16-IDTBT), for which hole mobilities of 8 and 11 cm2 V-1 s-1, respectively, are obtained. Doping of the 6,13-bis(triisopropylsilylethynyl)pentacene:PTAA blend with B(C6F5)3 is also shown to increase the maximum hole mobility to 3.7 cm2 V-1 s-1. Analysis of the single and multicomponent materials reveals that B(C6F5)3 plays a dual role, first acting as an efficient p-dopant, and secondly as a microstructure modifier. Semiconductors that undergo simultaneous p-doping and dopant-induced long-range crystallization are found to consistently outperform transistors based on the pristine materials. Our work underscores Lewis acid doping as a generic strategy towards high performance printed organic microelectronics.Entities:
Keywords: Lewis acid dopant; doping; organic semiconductors; organic transistors; printed flexible electronics
Year: 2017 PMID: 29375962 PMCID: PMC5770661 DOI: 10.1002/advs.201700290
Source DB: PubMed Journal: Adv Sci (Weinh) ISSN: 2198-3844 Impact factor: 16.806
Figure 1a) Chemical structures of diF‐TESADT, PTAA, and B(C6F5)3. b) Lowest unoccupied molecular orbital (LUMO) and highest occupied molecular orbital (HOMO) energies for B(C6F5)3 calculated via the DFT method. The HOMO is predicted to be localized on phenyl groups while the LUMO to be delocalized over the whole molecule. c) HOMO and LUMO energies of diF‐TESADT, PTAA, and B(C6F5)3. The LUMO energy value for B(C6F5)3 of −3.01 eV was measured via cyclic voltammetry (CV) in ref. 33 while the −4.81 was taken from ref. 34.
Figure 2a) Transfer characteristics and corresponding I D 1/2 versus V G plots measured for top‐gate, bottom‐contact diF‐TESADT:PTAA transistors with different B(C6F5)3 concentrations in the range 0–3.6 mol%. Inset shows the top‐gate, bottom‐contact transistor architecture employed. b) Evolution of hole mobility (µ h) as a function of B(C6F5)3 concentration. Panels (c) and (d) display the evolution of threshold voltage (V Th) and current on–off ratio, respectively, as a function of B(C6F5)3 concentration. e) Evolution of contact resistance (R C) versus V G calculated for the pristine and B(C6F5)3(2.4 mol%)‐doped diF‐TESADT:PTAA OTFTs. f) Work function (ϕ) and HOMO energy of the pristine and B(C6F5)3‐doped diF‐TESADT:PTAA blend layers measured by KP and APS, respectively.
Figure 3Polarized optical microscopy images of a) a pristine (0 mol%) and b) a B(C6F5)3‐doped (2.4 mol%) diF‐TESADT:PTAA blend layer. Topographical AFM images of c) a pristine (0 mol%) and d) a B(C6F5)3‐doped (2.4 mol%) diF‐TESADT:PTAA layer, and e) their corresponding height histograms. f) Cartoons representing schematics of the layer cross‐section of the pristine and B(C6F5)3‐doped diF‐TESADT:PTAA layers. g) Higher magnification AFM image of region A (box) highlighted in panel (d). Line scans h) 1 and i) 2 obtained from the AFM image in panel (g).
Figure 4a) X‐ray diffractograms for the four samples studied namely, diF‐TESADT, diF‐TESADT:B(C6F5)3, diF‐TESADT:PTAA, and diF‐TESADT:PTAA:B(C6F5)3(2.4 mol%). b) X‐ray diffractograms around the (001) peak (symbols) and the corresponding Voigt fits.
Figure 5a,b) Chemical structures of the materials used in the two additional semiconducting blends. c) Topography AFM images of the pristine (0 mol%) and B(C6F5)3‐doped (0.05 mol%) layers composed of C8‐BTBT:C16IDT‐BT and d) the corresponding height histograms. e) Topography AFM images of the pristine (0 mol%) and B(C6F5)3‐doped (2.4 mol%) TIPS‐pentacene:PTAA layers and f) the corresponding height histograms. Panels (g) and (h) show the extracted field‐effect hole mobility measured in saturation (µSAT), for the pristine and B(C6F5)3‐doped C8‐BTBT:C16IDT‐BT (g) and TIPS‐pentacene:PTAA (h) transistors.