Literature DB >> 29372203

Self-standing aptamers by an artificial defect-rich matrix.

Chong-You Chen1, Chang-Ming Wang, Pai-Shan Chen, Wei-Ssu Liao.   

Abstract

The classical alkanethiol post-passivation can prevent nonspecific binding of nucleotide bases onto supporting substrates and help aptamers transition from a "lying down" to a "standing up" orientation. However, the surface probes display lower binding affinity towards targets than those in bulk solutions due to unsatisfied hybridization spaces on the alkanethiol passivated substrate. To overcome this challenge, an artificial defect-rich matrix possessing an aptamer "self-standing" property created by chemical lift-off lithography (CLL) is demonstrated. This approach provided artificial defects on a hydroxyl-terminated alkanethiol self-assembled monolayer (SAM), which allowed the insertion of thiolated aptamers. The diluted surface molecular environment assisted aptamers not only to "self-stand" on the surface, but also to separate from each other, providing a suitable surface aptamer density and sufficient space for capturing targets. With this approach, the binding affinity of the aptamer towards a target was comparable to solution-type probes, showing higher recognition efficiency than that in conventional methods.

Entities:  

Year:  2018        PMID: 29372203     DOI: 10.1039/c7nr07381j

Source DB:  PubMed          Journal:  Nanoscale        ISSN: 2040-3364            Impact factor:   7.790


  4 in total

1.  Large-Area, Ultrathin Metal-Oxide Semiconductor Nanoribbon Arrays Fabricated by Chemical Lift-Off Lithography.

Authors:  Chuanzhen Zhao; Xiaobin Xu; Sang-Hoon Bae; Qing Yang; Wenfei Liu; Jason N Belling; Kevin M Cheung; You Seung Rim; Yang Yang; Anne M Andrews; Paul S Weiss
Journal:  Nano Lett       Date:  2018-08-06       Impact factor: 11.189

2.  Chemical Lift-Off Lithography of Metal and Semiconductor Surfaces.

Authors:  Kevin M Cheung; Dominik M Stemer; Chuanzhen Zhao; Thomas D Young; Jason N Belling; Anne M Andrews; Paul S Weiss
Journal:  ACS Mater Lett       Date:  2019-12-03

3.  Wafer-scale bioactive substrate patterning by chemical lift-off lithography.

Authors:  Chong-You Chen; Chang-Ming Wang; Hsiang-Hua Li; Hong-Hseng Chan; Wei-Ssu Liao
Journal:  Beilstein J Nanotechnol       Date:  2018-01-26       Impact factor: 3.649

4.  Large Area Nanoparticle Alignment by Chemical Lift-Off Lithography.

Authors:  Chong-You Chen; Chia-Hsuan Chang; Chang-Ming Wang; Yi-Jing Li; Hsiao-Yuan Chu; Hong-Hseng Chan; Yu-Wei Huang; Wei-Ssu Liao
Journal:  Nanomaterials (Basel)       Date:  2018-01-27       Impact factor: 5.076

  4 in total

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