Greg Hughes1, Jared C Lewis2. 1. Department of Process Research and Development Merck Sharp & Dohme Corporation , Rahway, New Jersey 07065, United States. 2. Searle Chemistry Lab, Department of Chemistry, The University of Chicago , 5735 South Ellis Avenue, Chicago, Illinois 60637, United States.
Authors: Arsenij Kokorin; Pavel D Parshin; Patrick J Bakkes; Anastasia A Pometun; Vladimir I Tishkov; Vlada B Urlacher Journal: Sci Rep Date: 2021-11-04 Impact factor: 4.379
Authors: Francisca Contreras; Subrata Pramanik; Aleksandra M Rozhkova; Ivan N Zorov; Olga Korotkova; Arkady P Sinitsyn; Ulrich Schwaneberg; Mehdi D Davari Journal: Int J Mol Sci Date: 2020-02-26 Impact factor: 5.923
Authors: Krysten A Jones; Harrison M Snodgrass; Ketaki Belsare; Bryan C Dickinson; Jared C Lewis Journal: ACS Cent Sci Date: 2021-09-13 Impact factor: 14.553