Anup Dadlani, Shinjita Acharya, Orlando Trejo, Dennis Nordlund1, Mirco Peron2, Javad Razavi2, Filippo Berto2, Fritz B Prinz3, Jan Torgersen2. 1. Stanford Synchrotron Radiation Lightsource, SLAC National Accelerator Laboratory , Menlo Park, California 94025, United States. 2. Department of Mechanical and Industrial Engineering, Norwegian University of Science and Technology , Trondheim 7491, Norway. 3. Department of Materials Science and Engineering, Stanford University , Stanford, California 94305, United States.
Abstract
Zn(O,S) buffer layer electronic configuration is determined by its composition and thickness, tunable through atomic layer deposition. The Zn K and L-edges in the X-ray absorption near edge structure verify ionicity and covalency changes with S content. A high intensity shoulder in the Zn K-edge indicates strong Zn 4s hybridized states and a preferred c-axis orientation. 2-3 nm thick films with low S content show a subdued shoulder showing less contribution from Zn 4s hybridization. A lower energy shift with film thickness suggests a decreasing bandgap. Further, ZnSO4 forms at substrate interfaces, which may be detrimental for device performance.
Zn(O,S) buffer layer electronic configuration is determined by its composition and thickness, tunable through atomic layer deposition. The Zn K and L-edges in the X-ray absorption near edge structure verify ionicity and covalency changes with S content. A high intensity shoulder in the Zn K-edge indicates strong Zn 4s hybridized states and a preferred c-axis orientation. 2-3 nm thick films with low S content show a subdued shoulder showing less contribution from Zn 4s hybridization. A lower energy shift with film thickness suggests a decreasing bandgap. Further, ZnSO4 forms at substrate interfaces, which may be detrimental for device performance.
Entities:
Keywords:
X-ray absorption near edge structure (XANES); Zn(O,S); atomic layer deposition (ALD); buffer layers; oxysulfide films
Zn(O,S) thin films are excellent alternatives for the commonplace
toxic CdS layers in CIGSe solar cells.[1,2] Atomic layer
deposition (ALD) is an especially promising tool for Zn(O,S) fabrication,
allowing precise tailoring of layer thickness and O/S ratio.[3] The films’ key properties (band gap, conduction
band offset, conductivity) can be changed, leading to higher overall
efficiencies (18.5%[4]). Yet the standard
technique, chemical bath deposition (CBD), still renders architectures
with higher efficiencies. A better characterization of the structure–property
relationships of ALD layers will further push their development and
understanding.[5] The elemental specificity
of X-ray absorption techniques makes them promising for revealing
atomic and electronic structure of ALD films.[6−8] Via X-ray absorption
near edge structure (XANES), the band gap bowing phenomenon with S
concentrations was explained.[9] The rise
to S 3p–Zn 4sp–O 2p hybridized states with the incorporation
of S in ZnO affects ionicities of certain bonds causing changes in
the band gap. The interface of Zn(O,S) to ZnO electrodes contains
sulfate due to S diffusion.[10] Sulfate increases
resistivity and loss in the fill factor, which may explain performance
differences with different deposition methods.These insights
derived from studying the two ligands. The Znmetal edges can provide
similar conclusions in addition to a deeper understanding of Zn coordination
depending on compositions and thicknesses.Figure a shows a comparison of XANES
spectra at the Zn K-edge for Zn(O,S) films (50–60 nm) along
with references (Zn(O,S) film details Figure S1). The ZnO reference has four features, A–D, ZnS reference
with features E–H. ZnO appears similar to literature except
for a stronger A peak.[11−13] A and B show a transition from Zn 1s to Zn 4sp–O
2p and Zn 1s to Zn 4p–O 2p hybridized states of the conduction
band respectively (Figure b). The stronger A peak is apparent in the ZnO and 10% samples
(percentage is H2S to total oxidant (H2S+H2O) pulses, see Supporting Information). This indicates a preferred (200) orientation of ZnO unit cells
(XRD Figure S2).[9] The X-ray electric field interacts with the crystal in the (1,0,1)
direction, the A/B ratio increases because of strong interaction with
σ bonds.[14,15]
Figure 1
(a) X-ray absorption characterization
at Zn K-edge are shown for Zn(O,S) films deposited on Si substrates
including references of Zn foil, ALD ZnO, and ZnS. Zn K-edge spectra
were background subtracted and atomically normalized in the energy
region from 9690 to 9700 eV. (b) Normalized derivative spectra of
Zn K-edge.
Figure 2
(a) Theoretical multiple scattering (MS) calculations
at the Zn K-edge as a function of the cluster size for ZnO for clusters
with increasing atomic shells: 3, 5, 7, 11, 16, 20, and 24. The 24-shell
cluster corresponds to a sphere of radius 10 Å. The experimental
ZnO curve is shown above as a reference. Feature D develops when 5
shells (short-range order) are considered and C appears when 11 shells
(midrange order) are considered, predominantly pertaining to multiple
scattering. (b) Calculations of the partial density of states (pDOS)
of ZnO plotted together with the experimental XAS spectrum. The earlier
part of conduction band is composed of hybridized O 2p–Zn 4sp
states. (c) Theoretical MS calculations at the Zn K-edge as a function
of the cluster size for ZnS for clusters with increasing atomic shells:
2, 3, 5, 6, 8, 11, and 13. The 13-shell cluster corresponds to a sphere
of radius 10 Å. The experimental ZnS curve is shown above as
a reference. Feature G and H develop when 5 shells (midrange order)
are considered, predominantly pertaining to multiple scattering. (d)
Calculations of the partial density of states (pDOS) of ZnS plotted
together with the experimental XAS spectrum. The earlier part of conduction
band is composed of hybridized S 3p–Zn 4sp states. Calculations
of the partial density of states (pDOS) relative to the Fermi level
(total density of states shifted so onset of band gap is at 0 eV)
plotted together with the experimental XAS spectra [XAS spectrum aligned
by matching max intensity to max pDOS intensity of absorbing atom]
for b and d.
(a) X-ray absorption characterization
at Zn K-edge are shown for Zn(O,S) films deposited on Si substrates
including references of Zn foil, ALDZnO, and ZnS. Zn K-edge spectra
were background subtracted and atomically normalized in the energy
region from 9690 to 9700 eV. (b) Normalized derivative spectra of
Zn K-edge.(a) Theoretical multiple scattering (MS) calculations
at the Zn K-edge as a function of the cluster size for ZnO for clusters
with increasing atomic shells: 3, 5, 7, 11, 16, 20, and 24. The 24-shell
cluster corresponds to a sphere of radius 10 Å. The experimental
ZnO curve is shown above as a reference. Feature D develops when 5
shells (short-range order) are considered and C appears when 11 shells
(midrange order) are considered, predominantly pertaining to multiple
scattering. (b) Calculations of the partial density of states (pDOS)
of ZnO plotted together with the experimental XAS spectrum. The earlier
part of conduction band is composed of hybridized O 2p–Zn 4sp
states. (c) Theoretical MS calculations at the Zn K-edge as a function
of the cluster size for ZnS for clusters with increasing atomic shells:
2, 3, 5, 6, 8, 11, and 13. The 13-shell cluster corresponds to a sphere
of radius 10 Å. The experimental ZnS curve is shown above as
a reference. Feature G and H develop when 5 shells (midrange order)
are considered, predominantly pertaining to multiple scattering. (d)
Calculations of the partial density of states (pDOS) of ZnS plotted
together with the experimental XAS spectrum. The earlier part of conduction
band is composed of hybridized S 3p–Zn 4sp states. Calculations
of the partial density of states (pDOS) relative to the Fermi level
(total density of states shifted so onset of band gap is at 0 eV)
plotted together with the experimental XAS spectra [XAS spectrum aligned
by matching max intensity to max pDOS intensity of absorbing atom]
for b and d.The free energy force
field (FEFF) (feff is the effective curved
wave scattering amplitude in the EXAFS equation) simulated curves
match experimental references. ZnO appears a better match than ZnS,
also observed previously.[16] The pDOS calculations
reveal that Zn 4p contributions are stronger for B. Lower energy Zn
4p and 4s contributions to A are lower, resulting in a lower A/B ratio
in conventional ZnO films without preferred orientation (as the films
observed here). C (midrange order) and D (short-range order) mainly
arise from multiple scattering (Figure a). Features E and F are transitions from Zn 1s to
Zn 4sp–S 3p and Zn 1s to Zn 4p–S 3p hybridized states
of the conduction band respectively (Figure d). From Figure c, peaks G and H (midrange order) arise from
multiple scattering with contributions from a transition to Zn 4p
states (Figure d).
10% bears great resemblance to reference ZnO, with the least S but
a noticeable change in the Zn environment within the largely ZnO matrix.
B/A has decreased. The broadening indicates a distortion in the local
bonding environment with S incorporation affecting the orbital mixing.
The participation of O 2p orbitals likely forms Zn 4sp–S 3p–O
2p hybridized states. B has a low energy shift, indicating longer
Zn–O bonds.[17] C and D are weaker
because of the disruption of long-range order with S atoms into the
ZnO. 20% appears nearly featureless. Its spectral shape is a better
match with the reference ZnS. This corroborates with the 20% XRD pattern
shown previously (broad peak at 2θ above ZnS (111) and below
ZnO (100)).[9] The lack of features suggests
Zn is present in several environments. F/E is almost unity because
of this heterogeneity. E rises from newly formed hybridized states
with O 2p orbitals as shown in previous DOS calculations for the ternary
films. H is no longer present. The distortion resulted in a reduction
of order corroborated by our previous findings.[9] 33% is similar to ZnS with a few differences. F/E is lower
because of hybridized O 2p orbitals to E. G is weaker because of distortions
caused by O. Modified hybridized states in the conduction band have
more distinct resonances in the near edge with O 2p character changing
the structure and the spectrum (summary of Zn K-edge XANES in Table ). The intensity and
full width at half-maximum (fwhm) of the first peak is a measure of
the relative ionicity/covalency of the system.[18,19] A clear trend is present in the intensity of the first peak (Figure b). With increasing
S, it increases and broadens, resulting in a larger fwhm. The ionicity
is increasing; the Zn–O bonds lengthen with S, as previously
suggested.[9] The shift of the first peak
in the Zn K-edge (∼0.5 eV, Figure S3), and the spectral weight shift to lower energy seen in the Zn L-edge
(Figure ) corroborates
this. Here, this is concluded from experimental results only, as the
ionicity is apparent. For the O–K edge, this was concluded
only after performing a series of multiple scattering (MS) simulations.
Table 1
Zn K-Edge Features and Qualitative Assignments for
ZnO and ZnSa
label
energy (eV)
assignment
A
9663.8
Zn 1s → Zn 4sp –
O 2p
B
9668.4
Zn 1s → Zn 4p – O 2p
C
9679.3
MS (11 shells midrange order)
D
9683.4
MS (5 shells short-range order)
E
9662.8
Zn 1s → Zn 4sp – S 3p
F
9664.9
Zn 1s → Zn 4p – S 3p
G and H
9669.1 and 9672.6
MS (5 shells midrange order)
MS = multiple scattering and its assignment means it is a major contributor
to that particular peak. Assignment of hybridized states means that
it is a contributor of a peak along with short- and long-range orders.
Figure 3
(a) X-ray absorption characterization
at Zn LIII-edge is shown for Zn(O,S) films deposited on SiO2 including references of ALD ZnO and ZnS. Zn L-edge spectra were
background subtracted and atomically normalized in the energy region
from 1063–1073 eV. (b) Derivative absorption spectra at Zn
LIII-edge showing that as the S concentration increases, so too does
the ionicity of the system.
MS = multiple scattering and its assignment means it is a major contributor
to that particular peak. Assignment of hybridized states means that
it is a contributor of a peak along with short- and long-range orders.(a) X-ray absorption characterization
at Zn LIII-edge is shown for Zn(O,S) films deposited on SiO2 including references of ALDZnO and ZnS. Zn L-edge spectra were
background subtracted and atomically normalized in the energy region
from 1063–1073 eV. (b) Derivative absorption spectra at Zn
LIII-edge showing that as the S concentration increases, so too does
the ionicity of the system.Figure a
shows Zn LIII-edge XANES spectra. ALDZnO and ZnS (300 cycles) resemble
published spectra.[14] Despite the difference
in dipole selectivity (the L-edge excites 2p electrons into the frontier
orbitals), trends are similar to those in the Zn K-edge. Zn has a
filled d-shell, there are no sharp direct transitions to 3d states
that swamp the rest of the spectrum as in other transition metals.
The initial shoulder is weaker but separated from the main peak (because
of the smaller lifetime broadening in the soft X-ray regime). With
increasing S, the shoulder rises and the main peak shifts to lower
energy, the shoulder begins to disappear. The spectral weight shifts
to lower energy with S as previously observed.[9] ZnO and 10% are closer in appearance as before, the LII edge onset
is earlier as in other samples (Figure S4). Increasing S delays the onset (Figure S4). 20% appears featureless, it is most distorted from either reference,
corroborated by XRD.[9] The sharper rise
in the derivative of the LIII edge with S lengthens the Zn–O
bonds, making them more ionic. ZnO is one of the most covalent monoxides.
ZnS is more ionic, giving it a very sharp rise at the onset (Figure b).[18]Thinner (2–3 nm) Zn(O,S) films require higher
S content to yield similar performances (conversion efficiency) as
thicker films, which still lacks a suitable explanation.[3] The order of ultrathin Zn(O,S) is not fully developed
and the composition is different. S alters the structure and coordination
of ZnO, the electrical properties (band gap, alignment and resistivity). Figure a reveals similarities
between the ultrathin film 10% and ZnO, yet with a more subdued A,
B is blue-shifted, and C and D are weaker because of the lack of long-range
order. 10% resembles ZnO in literature.[14] Decreasing contributions from Zn 4s hybridization with respect to
thicker samples impact device characteristics. Increasing S, 20% shows
only E and F. An early peak appears (derivative Figure b) that shifts the onset earlier, suggesting
a lower band gap of the 20% than in the other two compositions. The
electron donating behavior of the S ligand[20] decreases the Zn–S (increased covalency) and increases Zn–O
bond length (increased ionicity). Lack of midrange order and compositional
heterogeneity of Zn (increased local distortion) makes this spectrum
practically featureless. 33% gets closer to ZnS with less pronounced
E than in thicker films. F and G are nearly equivalent. G′s
high intensity indicates its higher midrange (20% is featureless in
that region, it is most distorted from either crystal structure[10]). All main peaks shift to slightly higher energy
than thick counterparts (Figure b and Figure S5a). 33%’s
high intensity G is obvious. The shoulders of 10% and 33% are less
pronounced than the 20%, where it appears at lower energy and separate
in the derivative. The main peak is broadened and at higher energy.
The features in the Zn LIII-edge of thin (Figure a) and thick samples are aligned with slight
intensity differences (Figure S3b). The
Zn LIII-edge is less sensitive to changes than the K-edge. The shoulder
in thin samples is not visible in thick ones indicating an increase
in the number of available states at this shoulder. In thin films,
S diffuses toward interfaces forming interfacial sulfate, which was
previously observed in the S K edge creating a high energy feature
at 2482.5 eV (Figure S5b, S6b) corroborated
by ARXPS.[10] The Zn LIII edge gives us an
indication for the identity of this interfacial sulfate. Peak A (Figure a) aligns with ZnSO4,[21] possibly sulfate bonded to
Zn. A secondary feature seen for ZnSO4 at 1035 eV is not
present, contradicting this assumption. Zn may be in two distinct
environments defining the A/B distribution, which is different in
thinner films. The effect of substrates on the growth Zn(O,S) ultrathin
films could not be revealed.[10] The Zn K-edge
in Figure b gives
insight into the electronic and geometric structure differences of
a 33% sample grown on nanoporous TiO2 NPs and SiO2. The film deposited on titania resembles the thick 33%, which is
close to the ZnS (Figure a). On SiO2, the spectrum is shifted to higher
energies with the first two peaks close in intensity. The nanoporous
anatase crystal structure is likely favoring Zn(O,S) crystalline growth
given its similarities to ZnS. This is not possible on SiO2. This preliminary substrate-induced growth insight renders further
mechanistic reasoning necessary.
Figure 4
(a) X-ray absorption characterization
at Zn K-edge are shown for Zn(O,S) thin films deposited on SiO2. Zn K-edge spectra were background subtracted and atomically
normalized in the energy region from 9690 to 9700 eV. (b) Normalized
derivative spectra of Zn K-edge.
Figure 5
(a) X-ray absorption characterization at Zn L-edges is shown for
Zn(O,S) thin films deposited on SiO2 (i.e., S10_20:10%
pulse ratio on SiO2 substrate, 20 cycles of deposition);
(b) X-ray absorption characterization at Zn K-edges are shown for
33% pulse ratio thin films deposited on SiO2 (sample name
S33_21) and nanoporous TiO2 (sample name T33_21).
(a) X-ray absorption characterization
at Zn K-edge are shown for Zn(O,S) thin films deposited on SiO2. Zn K-edge spectra were background subtracted and atomically
normalized in the energy region from 9690 to 9700 eV. (b) Normalized
derivative spectra of Zn K-edge.(a) X-ray absorption characterization at Zn L-edges is shown for
Zn(O,S) thin films deposited on SiO2 (i.e., S10_20:10%
pulse ratio on SiO2 substrate, 20 cycles of deposition);
(b) X-ray absorption characterization at Zn K-edges are shown for
33% pulse ratio thin films deposited on SiO2 (sample name
S33_21) and nanoporous TiO2 (sample name T33_21).Zn K and L-edges provide insight
into finely tuned ALDZn(O,S) films’ electronic and atomic
structure. Differences in ionicity and covalency with O/S were verified
regarding one element only. An enhanced shoulder of the main edge
in the Zn K-edge with Zn 4s hybridized states shows the wurzite ZnO’s
preferred c-axis orientation in the (200) direction.
The Zn K-edge of a 2–3 nm thick 10% Zn(O,S) sample has a significantly
subdued shoulder, indicating less contribution from Zn 4s hybridization.
All spectra have high energy with film thinness suggesting an increase
in bandgap. The thin 20% sample seems most distorted with the lowest
spectral onset. The Zn K-edge allows us to gather insight into the
different growth modes of Zn(O,S) on TiO2 NPs versus SiO2 substrates. The Zn L-edges indicated the formation of ZnSO4 at the interface. Utilizing the metal edge, we provide first
time material property knowledge for improving and understanding thin
film Zn(O,S)-based solar cell performance characteristics.
Authors: Orlando Trejo; Katherine E Roelofs; Shicheng Xu; Manca Logar; Ritimukta Sarangi; Dennis Nordlund; Anup L Dadlani; Rob Kravec; Neil P Dasgupta; Stacey F Bent; Fritz B Prinz Journal: Nano Lett Date: 2015-11-13 Impact factor: 11.189
Authors: Jan Torgersen; Shinjita Acharya; Anup Lal Dadlani; Ioannis Petousis; Yongmin Kim; Orlando Trejo; Dennis Nordlund; Fritz B Prinz Journal: J Phys Chem Lett Date: 2016-04-05 Impact factor: 6.475
Authors: Anup L Dadlani; Shinjita Acharya; Orlando Trejo; Fritz B Prinz; Jan Torgersen Journal: ACS Appl Mater Interfaces Date: 2016-05-31 Impact factor: 9.229