| Literature DB >> 28932669 |
Jin Zhang1,2, Hao Hong3, Chao Lian1, Wei Ma1,2, Xiaozhi Xu3, Xu Zhou3, Huixia Fu1,2, Kaihui Liu3,4, Sheng Meng1,2,4.
Abstract
Light-induced interlayer ultrafast charge transfer in 2D heterostructures provides a new platform for optoelectronic and photovoltaic applications. The charge separation process is generally hypothesized to be dependent on the interlayer stackings and interactions, however, the quantitative characteristic and detailed mechanism remain elusive. Here, a systematical study on the interlayer charge transfer in model MoS2/WS2 bilayer system with variable stacking configurations by time-dependent density functional theory methods is demonstrated. The results show that the slight change of interlayer geometry can significantly modulate the charge transfer time from 100 fs to 1 ps scale. Detailed analysis further reveals that the transfer rate in MoS2/WS2 bilayers is governed by the electronic coupling between specific interlayer states, rather than the interlayer distances, and follows a universal dependence on the state-coupling strength. The results establish the interlayer stacking as an effective freedom to control ultrafast charge transfer dynamics in 2D heterostructures and facilitate their future applications in optoelectronics and light harvesting.Entities:
Keywords: MoS2/WS2 heterostructures; TDDFT calculations; interlayer‐state‐coupling; stacking configurations; ultrafast charge transfer
Year: 2017 PMID: 28932669 PMCID: PMC5604380 DOI: 10.1002/advs.201700086
Source DB: PubMed Journal: Adv Sci (Weinh) ISSN: 2198-3844 Impact factor: 16.806
Figure 1Atomic and electronic structure of the MoS2/WS2 bilayer. a) Side view of MoS2/WS2 bilayers. Green, red, and light yellow spheres represent Mo, W, and S atoms, respectively. b) Projected density of states (PDOS) on MoS2 and WS2 layer. Photoexcited holes will transfer from MoS2 valence bands to WS2.
Figure 2Charge transfer dynamics in AB1‐2H stacked MoS2/WS2 bilayers. a) Energy band dispersion of MoS2/WS2 bilayer in AB1‐2H stacking order. |1>, |−1>, and |−2> indicate these corresponding states at K point in the Brillouin zone. b) Evolution of electronic energy levels after photoexcitation. The orange (dark yellow) curve indicates the energy levels of photoexcited hole (electron) states. c) The fractions of photoexcited holes (electrons) that transferred from MoS2 to WS2 layer. d–f) Snapshots of the spatial distribution of hole density at 0, 60, and 150 fs after photoexcitation at a contour level of 0.02 e Å−3. The upper (lower) layer is WS2 (MoS2).
Calculated parameters for MoS2/WS2 bilayers
| Stacking |
|
|
| τ | |
|---|---|---|---|---|---|
| AB1‐2H | 6.3 | −30.6 | 0.42 | 150 | |
| AB1‐2H | Artificial | 6.0 | −27.5 | 0.62 | 120 |
| AB1‐2H | Artificial | 7.0 | −20.0 | 0.16 | 320 |
| AB1‐2H | Artificial | 7.3 | −16.2 | 0.005 | 1600 |
| AB2‐2H | 6.3 | −28.3 | 0.06 | 1100 | |
| AA1‐3R | 6.3 | −28.7 | 0.02 | 1500 | |
| AA2‐3R | 6.8 | −19.7 | 0.18 | 180 |
d: interlayer spacing
E: formation energy
M: dipole transition matrix element; and
τ: hole transfer lifetime.
Figure 3a–d) Hole transfer evolution for MoS2/WS2 in different stacking configurations. The transfer lifetime is fitted by an exponential relation. The insets give out the schematic atomic structure, interlayer spacing, and lifetime. From the consideration of total interlayer distances, one would expect τAB1 ≈ τAB2 ≈ τAA1 ≪ τAA2, but the simulation results show τAB1 ≈ τAA2 ≪ τAB2 ≈ τAA1. It reveals that the charger transfer time has no obvious correlation to the total interlayer coupling strength.
Figure 4Interlayer‐state‐coupling dependent charge transfer rate in MoS2/WS2 bilayers. a) Dependence of the charge transfer rates (1/τ) on the dipole transition coupling strength (M) between |−2> and |−1> states. AA1‐3R, AA2‐3R, AB1‐2H, and AB2‐2H data are, respectively, shown as circle, pentagon, square, and triangles. The interlayer spacing value of AB1‐2H (including those artificial ones) are labeled beside the data points. All data seat around the same curve, revealing a universal dependence of charge transfer rate on interlayer‐state‐coupling strength. b–e) Spatial distribution of |−2> and |−1> states in AB1‐2H and AA1‐3R stackings. The overlapping between |−2> and |−1> states along vertical direction on both the upper WS2 and lower MoS2 layers in AB1‐2H stacking is finite, while it is nearly zero in AA1‐3R stacking. Thus M AB1 ≫ M AA1 is understandable. The isosurface value is 1 × 10−3 e Å−3 in (b–e).