| Literature DB >> 28374755 |
Jonathan J Bean1, Mitsuhiro Saito2,3, Shunsuke Fukami4,5,6,7, Hideo Sato5,6,7, Shoji Ikeda5,6,7, Hideo Ohno3,4,5,6,7, Yuichi Ikuhara2,3, Keith P McKenna1.
Abstract
Polycrystalline metal oxides find diverse applications in areas such as nanoelectronics, photovoltaics and catalysis. Although grain boundary defects are ubiquitous their structure and electronic properties are very poorly understood since it is extremely challenging to probe the structure of buried interfaces directly. In this paper we combine novel plan-view high-resolution transmission electron microscopy and first principles calculations to provide atomic level understanding of the structure and properties of grain boundaries in the barrier layer of a magnetic tunnel junction. We show that the highly [001] textured MgO films contain numerous tilt grain boundaries. First principles calculations reveal how these grain boundaries are associated with locally reduced band gaps (by up to 3 eV). Using a simple model we show how shunting a proportion of the tunnelling current through grain boundaries imposes limits on the maximum magnetoresistance that can be achieved in devices.Entities:
Year: 2017 PMID: 28374755 PMCID: PMC5379487 DOI: 10.1038/srep45594
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1ABF-STEM images of MgO polycrystalline samples.
(a) Schematic showing the magnetic tunnel junction investigated in this study with cross-sectional and plan-view imaging directions indicated. (b) ABF-STEM images showing the nanometre scale granular structure of the MgO films. (c,d) Examples of commonly occurring structural units at grain boundaries corresponding to segments of a Σ5(210)[001] symmetric tilt grain boundary (c) and a (100)/(110)[001] asymmetric tilt grain boundary (d). The white dashed boxes indicate the periodic supercells which are used to model these grain boundary defects.
Figure 2Theoretical models of MgO thin films.
Supercells used to model commonly occurring grain boundary structures present in MgO films. (a) Σ5(210)[001] symmetric tilt grain boundary and (b) (100)/(110)[001] asymmetric tilt grain boundary. Red and green atoms represent O and Mg respectively. Shaded areas signify which atoms are used to produce the projected density of states shown in Fig. 4.
Figure 3TEM image simulations of theoretical MgO models.
TEM image simulations based on first principles theoretical models. a) Σ5(210)[001] symmetric tilt grain boundary and b) (100)/(110)[001] asymmetric tilt grain boundary.
Figure 4Density of states near MgO interfaces.
Density of states of the (a) Σ5(210)[001] symmetric tilt grain boundary and (b) (100)/(110)[001] asymmetric tilt grain boundary calculated using the HSE06 functional. The DOS is projected onto bulk and interface regions (defined in Fig. 2). EVBM is the energy of the bulk valence band maximum. Roman numerals indicate regions of interfacial electronic states. The “×5” indicates the factor the DOS of the unoccupied states have been increased by to aid visualisation.
Figure 5Localisation of the charge density near MgO interfaces.
Total charge density (norm of the eigenfunctions) associated with electronic states in particular energy windows for the Σ5(210)[001] symmetric tilt grain boundary and (100)/(110)[001] asymmetric tilt grain boundary in MgO. The energy windows (I− IV) are highlighted in Fig. 4. The red and green atoms represent O and Mg respectively and the charge density is represented by the blue isosurfaces.
Figure 6Dependence of TMR with grain thickness.
Predicted dependence of the total magnetoresistance of granular FeCoB/MgO/FeCoB magnetic tunnel junctions on average MgO grain size (d) and the energy difference between the electrode Fermi energy and lowest unoccupied bands at the grain boundary (ΔEgb). The bulk and grain boundary TMR values employed in the model are also indicated by dashed lines.