| Literature DB >> 28295951 |
Grzegorz Greczynski1, Lars Hultman1.
Abstract
The C 1s signEntities:
Keywords: X-ray photoelectron spectroscopy; analytical methods; binding energy; surface analysis; surface chemistry
Year: 2017 PMID: 28295951 PMCID: PMC5484993 DOI: 10.1002/cphc.201700126
Source DB: PubMed Journal: Chemphyschem ISSN: 1439-4235 Impact factor: 3.102
Figure 1C 1s XPS spectra of adventitious carbon obtained from as‐received air‐exposed (ca. 10 min.) polycrystalline (TM)N thin films, where TM=Mo, V, W, Ti, Cr, Nb, Ta, Zr, and Hf, grown by magnetron sputtering on Si(001) substrates.
Binding energies relative to Fermi level for all component peaks in C 1s spectra together with work function values obtained from polycrystalline (TM)N thin films in the as‐received state, where TM=Mo, V, W, Ti, Cr, Nb, Ta, Zr, and Hf.
| (TM)N | C 1s BE relative to Fermi level, | ΔBE CC−O−CC−C | ΔBE CO−C=O−CC−C | Work function [eV] | ||
|---|---|---|---|---|---|---|
| C−C/C−H | C−O | O−C=O | ||||
| TiN | 284.52 | 286.24 | 289.06 | 1.72 | 4.54 | 4.90 |
| VN | 284.15 | 285.96 | 288.51 | 1.81 | 4.36 | 5.16 |
| CrN | 284.60 | 286.14 | 288.56 | 1.54 | 3.96 | 4.83 |
| ZrN | 285.49 | 287.21 | 289.54 | 1.72 | 4.05 | 4.09 |
| NbN | 284.76 | 286.52 | 289.18 | 1.76 | 4.42 | 4.65 |
| MoN | 284.08 | 285.76 | – | 1.68 | – | 5.35 |
| HfN | 285.52 | 287.17 | 289.75 | 1.65 | 4.23 | 4.00 |
| TaN | 285.08 | 286.75 | 289.39 | 1.67 | 4.31 | 4.41 |
| WN | 284.22 | 285.73 | – | 1.71 | – | 5.23 |
Figure 2Surface carbon concentrations plotted as a function of air exposure time for polycrystalline (TM)N thin films, where TM=Mo, V, W, Ti, Cr, Nb, Ta, Zr, and Hf, grown by magnetron sputtering on Si(001) substrates.
Figure 3a) Binding energy of the C−C/C−H peak in the C 1s spectra of adventitious C referenced to Fermi level , b) work function obtained by UPS from the secondary electron cut‐off , and c) C 1s BE referenced to Vacuum level for a set of polycrystalline (TM)N thin films, where TM=Mo, V, W, Ti, Cr, Nb, Ta, Zr, and Hf, grown by magnetron sputtering on Si(001) substrates. The dashed curves in (a) and (b) are only for eye guiding to emphasize the symmetry between the plots.
Figure 4The portion of the valence band spectra in the close vicinity of the Fermi level EF indicating the Fermi level cut‐off for as‐received polycrystalline (TM)N thin films, where TM=Mo, V, W, Ti, Cr, Nb, Ta, Zr, and Hf, grown on Si(001) substrates: a) as measured (referencing to E F), and b) aligned by using the common procedure of referencing to C 1s peak of adventitious carbon set at 284.5 eV.
Figure 5Schematic illustration of the energy level alignment at the interface between adventitious carbon layer and a) the low work function substrate, and b) the high work function substrate. For all tested samples the sum of and is constant, which is indicative of vacuum level alignment.