| Literature DB >> 27924243 |
Seunghon Ham1, Naroo Lee2, Igchun Eom3, Byoungcheun Lee3, Perng-Jy Tsai4, Kiyoung Lee1, Chungsik Yoon1.
Abstract
BACKGROUND: Relationships among portable scanning mobility particle sizer (P-SMPS), condensation particle counter (CPC), and surface area monitor (SAM), which are different metric measurement devices, were investigated, and two widely used research grade (RG)-SMPSs were compared to harmonize the measurement protocols.Entities:
Keywords: condensation particle counter; nanoparticle exposure assessment; relationship; scanning mobility particle sizer; surface area monitor
Year: 2016 PMID: 27924243 PMCID: PMC5127974 DOI: 10.1016/j.shaw.2016.08.001
Source DB: PubMed Journal: Saf Health Work ISSN: 2093-7911
The general characteristics of workplaces
| Workplace | Emitted/source of nanoparticles | Ventilation type | Process/task | Production rate | Workplace area (m2) | No. of nanoparticle handling workers | Possible other sources | Sampling duration | |
|---|---|---|---|---|---|---|---|---|---|
| LAB | A | Al2O3 | GV, fume hood | Transferred to crucible, transferred from crucible to vial, weighing | – | 120 | 2 | – | One shift + one off-duty time |
| B | Fe2O3, TiO2 | GV, fume hood | Weighing, sonication, Reaction | – | 78 | 7 | – | One shift + one off-duty time | |
| C | Graphene | GV, fume hood | Spraying air using compressor, dip-coater | – | 90 | 5 | – | One shift + one off-duty time | |
| ENP | D | TiO2, ZnO | GV | Reaction, dehydration, mixing, drying, bagging, lunch | TiO2: 10 ton/y | 1,400 | 10 | Fork lift | Two day shifts + one night shift |
| E | Cu-Ni alloy, Ni | LEV and isolation | Collecting, sieving, lunch | Ni: 100 kg/y | 97 | 6 | – | One shift | |
| F | Fumed silica | LEV, GV | Packaging, meal (lunch, dinner), break time, night shift - no works, outdoor, warehouse | 9,000 ton/y | 3,500 | 12 | Fork lift | Two day shifts + one night shift | |
| UNP | G | Welding (Arc, SUS) | GV | Arc welding, SUS welding, break time, lunch | – | Arc: 10,000 | 100 | Fork lift | Two day shifts |
| H | Welding (Arc) | GV | Arc welding, grinding (day shift, night shift), lunch | – | 2,017 | 30 | Fork lift | Two day shifts + one night shift | |
| I | Smelting process, Welding (Arc) | GV | Smelting, welding, break time, lunch | – | 11,000 | Smelting: 15/shift × 2 | Fork lift | Two day shifts + one night shift |
ENP, engineered nanoparticle manufacturing workplace; GV, general ventilation; LAB, laboratory; LEV, local exhaust ventilation; UNP, unintended nanoparticle emitted workplace.
Parameters of the research-grade scanning mobility particle sizers (RG-SMPSs) used for comparison at engineered nanoparticle manufacturing workplace-E
| Grimm RG-SMPS | TSI RG-SMPS | |
|---|---|---|
| Model | 5.403+C | 3936L75 |
| DMA | Vienna type (Larger to smaller) Long-DMA | TSI-3081 |
| Scanning sequences | Larger particles to smaller particles | Smaller particles to larger particles |
| Neutralizer | AM241 (α emitter) | Kr85 (β emitter) |
| Measurement range | 11.1–1083.3 nm | 14.6–661.1 nm |
| Aerosol sampling rate (L/min) | 0.3 | 0.3 |
| Sheath air flow rate (L/min) | 3 | 3 |
| Sampling interval | 333 s | 135 s |
| CPC type | Butanol based | Butanol based |
| CPC maximum concentration | 107 particles/cm3 | 107 particles/cm3 |
CPC, condensation particle counter; DMA, differential mobility analyzer.
The descriptive statistics of three workplace types and total measured by P-SMPS, CPC, and SAM
| Workplace | Geometric mean (geometric standard deviation) (5th–95th percentile) | ||||
|---|---|---|---|---|---|
| Portable-SMPS (particles/cm3) | CPC (particles/cm3) | SAM (μm2/cm3) | |||
| Total number concentration | ≤ 100 nm | > 100 nm | |||
| LAB (A, B, C) | 8,458 (1.41) | 5,879 (1.49) | 2,521 (1.30) | 6,143 (1.45) | 32.79 (1.46) |
| ENP (D, E, F) | 19,612 (2.18) | 14,969 (2.18) | 4,643 (2.00) | 11,955 (2.42) | 93.68 (2.60) |
| UNP (G, H, I) | 84,172 (2.80) | 61,167 (2.94) | 16,539 (3.23) | 38,886 (2.61) | 358.41 (2.74) |
CPC, condensation particle counter; ENP, engineered nanoparticle manufacturing workplace; LAB, laboratory; LEV, local exhaust ventilation; SAM, surface area monitor; SMPS, scanning mobility particle sizer; UNP, unintended nanoparticle emitted workplace.
Pearson correlation coefficient among measurement devices
| LAB ( | ENP ( | UNP ( | Total ( | |||||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| SMPS Total | ≤ 100 nm | > 100 nm | CPC | SAM | SMPS Total | ≤ 100 nm | > 100 nm | CPC | SAM | SMPS Total | ≤ 100 nm | > 100 nm | CPC | SAM | SMPS Total | ≤ 100 nm | > 100 nm | CPC | SAM | |
| SMPS Total | 1 | 1 | 1 | 1 | ||||||||||||||||
| ≤100 nm | 0.963 | 1 | 0.992 | 1 | 0.962 | 1 | 0.970 | 1 | ||||||||||||
| >100 nm | 0.830 | 0.650 | 1 | 0.829 | 0.753 | 1 | 0.671 | 0.445 | 1 | 0.742 | 0.558 | 1 | ||||||||
| CPC | 0.869 | 0.823 | 0.750 | 1 | 0.925 | 0.905 | 0.823 | 1 | 0.457 | 0.427 | 0.349 | 1 | 0.623 | 0.585 | 0.517 | 1 | ||||
| SAM | 0.883 | 0.766 | 0.908 | 0.889 | 1 | 0.857 | 0.825 | 0.824 | 0.834 | 1 | 0.648 | 0.525 | 0.705 | 0.538 | 1 | 0.745 | 0.644 | 0.770 | 0.694 | 1 |
All results of Pearson correlation coefficient were p < 0.001.
CPC, condensation particle counter; ENP, engineered nanoparticle manufacturing workplace; LAB, laboratory; LEV, local exhaust ventilation; SAM, surface area monitor; SMPS, scanning mobility particle sizer; UNP, unintended nanoparticle emitted workplace.
Fig. 1The concentration profiles measured by three sampling devices [scanning mobility particle sizer (SMPS), condensation particle counter (CPC), and surface area monitor] at (A) laboratory-A, (B) engineered nanoparticle-F, and (C) unintended nanoparticle emitting workplace-H.
Fig. 2Scanning electron microscopy images magnified by 50,000 at (A) laboratory-C, (B) engineered nanoparticle workplace-E, (C) unintended nanoparticle emitting workplace-H.
Nanoparticle concentrations measured by Grimm and TSI research-grade scanning mobility particle sizers (RG-SMPSs) at ENP-E (unit: dN/dlogDp [particles/cm3])
| SMPS Total | Grimm RG-SMPS | SMPS Total | TSI RG-SMPS | ||||
|---|---|---|---|---|---|---|---|
| ≤ 100 nm | > 100 nm | ≤ 100 nm | > 100 nm | ||||
| ENP-E ( | Mean | 122,429* | 91,389* | 31,040* | 147,031 | 104,317 | 42,713 |
| SD | 2,359 | 1,834 | 631 | 2,637 | 1,898 | 1,018 | |
| Median | 125,462 | 96,036 | 28,418 | 145,627 | 107,767 | 39,617 | |
| Percentile (5th–95th) | 62,134–173,921 | 42,422–131,046 | 18,625–46,620 | 87,221–204,526 | 59,393–145,322 | 25,758–61,954 | |
* p < 0.01.
ENP, engineered nanoparticle manufacturing workplace.
Fig. 4Size distributions for particles measured with the two different scanning mobility particle sizers in the test with same sampling location, engineered nanoparticle workplace-E.
Fig. 3Correlation graph and coefficient values between TSI and Grimm scanning mobility particle sizer by size ranges for number concentration at engineered nanoparticle workplace-E: (A) total, (B) working, and (C) background.