| Literature DB >> 27878008 |
Manisha Kundu1, Tsuyoshi Hasegawa2, Kazuya Terabe3, Kazuhiro Yamamoto4, Masakazu Aono1.
Abstract
We examined the structural properties of copper sulfide films as a function of the sulfurization time of 70-nm-thick Cu films. Copper sulfide films with various phases such as mixed metallic Cu-chalcocite, chalcocite, roxbyite, and covellite phases were formed with increasing sulfurization time. To evaluate the structural stability of various films, all the films were exposed to the ambient atmosphere for the same amount of time. Although the phase structure and stoichiometry of the films were maintained at a greater depth, the near-surface region of the films was oxidized and covered with overlayers of oxide, hydroxide, and/or sulfate species due to the exposure and reaction with the ambient atmosphere. The oxygen uptake and its reactivity with the copper sulfide film surfaces were enhanced with increasing sulfur content of the films. In addition, the type of divalent state of copper formed on the film surfaces depended on the phase structure, composition, and stoichiometry of the films.Entities:
Keywords: copper sulfide; x-ray diffraction; x-ray photoelectron spectroscopy
Year: 2008 PMID: 27878008 PMCID: PMC5099665 DOI: 10.1088/1468-6996/9/3/035011
Source DB: PubMed Journal: Sci Technol Adv Mater ISSN: 1468-6996 Impact factor: 8.090