| Literature DB >> 27762278 |
R Galceran1,2, I Fina1,3, J Cisneros-Fernández1, B Bozzo1, C Frontera1, L López-Mir1, H Deniz4, K-W Park5, B-G Park5, Ll Balcells1, X Martí6, T Jungwirth6,7, B Martínez1.
Abstract
Antiferromagnetic spintronics is an emerging field; antiferromagnets can improve the functionalities of ferromagnets with higher response times, and having the information shielded against external magnetic field. Moreover, a large list of aniferromagnetic semiconductors and metals with Néel temperatures above room temperature exists. In the present manuscript, we persevere in the quest for the limits of how large can anisotropic magnetoresistance be in antiferromagnetic materials with very large spin-orbit coupling. We selected IrMn as a prime example of first-class moment (Mn) and spin-orbit (Ir) combination. Isothermal magnetotransport measurements in an antiferromagnetic-metal(IrMn)/ferromagnetic-insulator thin film bilayer have been performed. The metal/insulator structure with magnetic coupling between both layers allows the measurement of the modulation of the transport properties exclusively in the antiferromagnetic layer. Anisotropic magnetoresistance as large as 0.15% has been found, which is much larger than that for a bare IrMn layer. Interestingly, it has been observed that anisotropic magnetoresistance is strongly influenced by the field cooling conditions, signaling the dependence of the found response on the formation of domains at the magnetic ordering temperature.Entities:
Year: 2016 PMID: 27762278 PMCID: PMC5071853 DOI: 10.1038/srep35471
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1Materials and magnetic properties.
(a) Sketch and STEM cross-section of antiferromagnetic-metallic (IrMn, 2 nm)/ferromagnetic-insulator (La2CoMnO6, LCMO) bilayer (b) Magnetization vs. temperature measured with H = 100 mT. (c) Magnetization vs. applied field measured at 5 K with H. In (a) and (b) H is applied in- the plane of the sample (//[100]STO).
Figure 2Transport and magnetotransport characterization.
(a) Sketch of the electrical contact configuration for the STO/LCMO(20 nm)/IrMn(2 nm). Equivalent to the one used in the Si/IrMn sample. (b) Temperature dependence of the absolute measured resistance for LCMO films with and without IrMn on top. Resistivity for IrMn at 5 K, temperature for the sample grown on SiOx and the one on LCMO is near 700 μOhms·cm. (c) Sketch of the applied magnetic field orientation with respect to the measurement current (d) AMR = (R(Φ) − R(Φ = 0))/R(Φ = 0) measurements at 5 K and μ0H = 3 T for STO/LCMO/IrMn and Si/IrMn samples recorded after field-cooling the samples at 2 T Φ = 0° and Φ = 90° indicate the field cooling direction perpendicular and parallel to the current, respectively.
Figure 3Exchange magnetic coupling effect.
(a) Magnetization versus applied magnetic field loops recorded after field cooling the samples along opposite directions. (b) Zoom of the (a) panel. In a and b, lines though data points correspond to the fitting of the expression M = M0·tanh[(H − HC)/δH] + χPM·H. (c) HEB extracted from 4 different hysteresis loops recorded upon successive field cools along opposite directions is plotted.
Figure 4Temperature and magnetic field dependence of anisotropic magnetoresistance.
(a) AMR measurements at 5 K and various fields for STO/LCMO/IrMn sample. (b) Map of AMR measurements at 5 K and various fields IrMn. (c) Dependence of the AMR on the plane of rotation of the magnetic field at 5 K. IP is the plane of the sample [with Φ angle as defined in Fig. 2(b)] and the OOP is the plane containing the directions of the current and the normal to the film [with α angle as defined in Fig. 2(b)]. (d) AMR recorded at different temperatures at 3 T.