| Literature DB >> 27213756 |
Linze Li1,2, Jason Britson3, Jacob R Jokisaari1,2, Yi Zhang1,2, Carolina Adamo4, Alexander Melville4, Darrell G Schlom4,5, Long-Qing Chen3, Xiaoqing Pan1.
Abstract
Controlled switching of resistivity in ferroelectric thin films is demonstrated by writing and erasing stable, nanoscale, strongly charged domain walls using an in situ transmission electron microscopy technique. The resistance can be read nondestructively and presents the largest off/on ratio (≈10(5) ) ever reported in room-temperature ferroelectric devices, opening new avenues for engineering ferroelectric thin-film devices.Keywords: charged domain walls; ferroelectrics; in situ transmission electron microscopy; resistive switching
Year: 2016 PMID: 27213756 DOI: 10.1002/adma.201600160
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849