| Literature DB >> 27140152 |
Roland Resel1, Markus Bainschab1, Alexander Pichler1, Theo Dingemans2, Clemens Simbrunner3, Julian Stangl3, Ingo Salzmann4.
Abstract
Dynamical scattering effects are observed in grazing-incidence X-ray diffraction experiments using an organic thin film of 2,2':6',2''-ternaphthalene grown on oxidized silicon as substrate. Here, a splitting of all Bragg peaks in the out-of-plane direction (z-direction) has been observed, the magnitude of which depends both on the incidence angle of the primary beam and the out-of-plane angle of the scattered beam. The incident angle was varied between 0.09° and 0.25° for synchrotron radiation of 10.5 keV. This study reveals comparable intensities of the split peaks with a maximum for incidence angles close to the critical angle of total external reflection of the substrate. This observation is rationalized by two different scattering pathways resulting in diffraction peaks at different positions at the detector. In order to minimize the splitting, the data suggest either using incident angles well below the critical angle of total reflection or angles well above, which sufficiently attenuates the contributions from the second scattering path. This study highlights that the refraction of X-rays in (organic) thin films has to be corrected accordingly to allow for the determination of peak positions with sufficient accuracy. Based thereon, a reliable determination of the lattice constants becomes feasible, which is required for crystallographic structure solutions from thin films.Entities:
Keywords: X-ray refraction; X-ray scattering; grazing-incidence X-ray diffraction; grazing-incidence diffraction; organic thin films; refraction correction; surface reflection; thin films
Year: 2016 PMID: 27140152 PMCID: PMC4853871 DOI: 10.1107/S1600577516003672
Source DB: PubMed Journal: J Synchrotron Radiat ISSN: 0909-0495 Impact factor: 2.616
Figure 1Experimental geometry for grazing-incidence X-ray diffraction with k 0 and k as wavevectors of incoming and scattered beams, respectively; αf and θf are the scattering angles, q is the scattering vector represented by an in-plane component q and an out-of-plane component q .
Figure 2Grazing-incidence X-ray diffraction pattern of a ternaphthalene thin film on an isotropic silicon oxide surface recorded at αi = 0.15°; intensities are plotted on a logarithmic color scale. The peaks A and A′ represent the components of the split 110 Bragg peak. The inset gives the chemical structure of the molecule.
Figure 3Line scans obtained by integration of reciprocal space map data along θf across the split 110 Bragg peak (integration range 1°). Data are collected at different incidence angles αi of the primary beam covering a range of 0.09° to 0.25°; curves are vertically shifted for clarity. The average position of the Yoneda peak is given by a vertical line labelled as αC.
Figure 4Integrated peak intensities of the peaks A and A′ as a function of the incident angle of the primary beam αi. The position of the observed critical angle of total external reflection αC is marked with an arrow.
Figure 5(a) Positions of the peaks A and A′ given by the out-of-plane scattering angle αf as a function of the incidence angle of the primary beam αi. (b) Calculated contribution of the scattering vector in the direction perpendicular to the surface (q ) for peaks A and A′ without (lines) and with corrections for both the inherent scattering path and optical refraction of X-rays (lines + symbols). For comparison, the q value of the reciprocal lattice vector G 110, is given.
Figure 6Monoclinic angle β of the NNN crystal structure as a function of the incident angle αi as calculated from the peak positions of A′, A, and A after correction for refraction effects. Additionally, the monoclinic angle of the single-crystal structure solution is given; error bars consider only uncertainties in the peak positions of the out-of-plane scattering angle αf.