| Literature DB >> 26643936 |
Giancarlo Canavese1, Alessandro Ricci1, Gian Carlo Gazzadi2, Ivan Ferrante1, Andrea Mura3, Simone Luigi Marasso1,4, Carlo Ricciardi1.
Abstract
The nanofabrication of a nanomachined holed structure localized on the free end of a microcantilever is here presented, as a new tool to design micro-resonators with enhanced mass sensitivity. The proposed method allows both for the reduction of the sensor oscillating mass and the increment of the resonance frequency, without decreasing the active surface of the device. A theoretical analysis based on the Rayleigh method was developed to predict resonance frequency, effective mass, and effective stiffness of nanomachined holed microresonators. Analytical results were checked by Finite Element simulations, confirming an increase of the theoretical mass sensitivity up to 250%, without altering other figures of merit. The nanomachined holed resonators were vibrationally characterized, and their Q-factor resulted comparable with solid microcantilevers with same planar dimensions.Entities:
Year: 2015 PMID: 26643936 PMCID: PMC4672296 DOI: 10.1038/srep17837
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1Mechanical characteristics of a nanomachined holed resonator.
(a) 3D sketch of nanomachined holed microcantilever resonator. (b) Normalized resonance frequency f, effective stiffness ke, effective mass me and mass sensitivity S, as a function of normalized number of holes n/N. (c,d) Normalized mass sensitivity S as a function of l/t and normalized number of holes n/N, for different aspect ratio h/t = 0.4 and h/t = 0.6.
Figure 2Nanomachined holed resonators: experiments.
(a) FESEM image of nanomachined holed microcantilever with regular pattern of square holes. (b) Plot of the experimental resonance curve in vacuum of reference and nanomachined holed cantilevers of chip C1. (c) FESEM image of a nanomachined holed microcantilever with a hole pattern proportional to the first mode shape. (b) Plot of the experimental resonance curve in vacuum of reference and nanomachined holed cantilevers of chip C2.
Geometric parameters of fabricated MCs.
| C1 | 126.3 | 3.8 | 2.5 | 25 | 0.68 | 2.1 |
| C2 | 126,0 | 3.9 | 2.2 | 41 | 0.68 | 1÷2.6 |
Experimental and theoretical data of MC with the regular hole pattern.
| C1 chip | 1th mode frequency (kHz) | S (Hz/pg) | |||
|---|---|---|---|---|---|
| Exp | FE | FE | Analytical | ||
| Reference | 213,1 | 212,6 | 216,3 | 216,3 | 160 |
| Nanomachined holed | 307,9 | 308,9 | 314,7 | 316,5 | 490 |
| Variation % | 44,5% | 45,2% | 45,5% | 46,3% | 206,3% |
abeam + substrate.
bbeam only.
Experimental and theoretical data of MC with the hole pattern proportional to the first mode shape.
| C2 chip | 1th mode frequency (kHz) | S (Hz/pg) | |||
|---|---|---|---|---|---|
| Exp | FE | FE | Analytical | ||
| Reference | 187,1 | 187,5 | 191,2 | 191,2 | 150 |
| Nanomachined holed | 278,4 | 277,8 | 283,0 | 286,2 | 520 |
| Variation % | 48,8% | 48,2% | 48,0% | 49,7% | 246.7% |
abeam + substrate.
bbeam only.