| Literature DB >> 25744355 |
Javeed Mahmood1, Eun Kwang Lee2, Minbok Jung3, Dongbin Shin4, In-Yup Jeon1, Sun-Min Jung1, Hyun-Jung Choi1, Jeong-Min Seo1, Seo-Yoon Bae1, So-Dam Sohn3, Noejung Park4, Joon Hak Oh5, Hyung-Joon Shin3, Jong-Beom Baek1.
Abstract
Recent graphene research has triggered enormous interest in new two-dimenEntities:
Year: 2015 PMID: 25744355 PMCID: PMC4366516 DOI: 10.1038/ncomms7486
Source DB: PubMed Journal: Nat Commun ISSN: 2041-1723 Impact factor: 14.919
Figure 1Preparation and structure.
(a) Schematic representation of the reaction between hexaaminobenzene (HAB) trihydrochloride and hexaketocyclohexane (HKH) octahydrate to produce the C2N-h2D crystal. The inset in the image of HAB is a polarized optical microscopy image of the HAB single crystal. Digital photographs: (b) as-prepared C2N-h2D crystal; (c) solution-cast C2N-h2D crystal on a SiO2 surface after heat-treatment at 700 °C; (d) a C2N-h2D crystal film (thickness: approximately 330 nm) transferred onto a PET substrate. The shiny metallic reflection of the sample indicates that it is highly crystalline.
Figure 2STM characterization.
(a) An atomic-resolution STM topography image of the C2N-h2D crystal on Cu(111). The STM image was obtained at a sample bias of 0.7 V and a tunnelling current of 300 pA. The top-left inset is the structure of the C2N-h2D crystal superimposed on the image. The bottom-right inset is 2D fast Fourier transform. (b) Simulated image (see the first-principles calculations in ESI). (c) The topographic height profile along deep-blue line. (d) The topographic height profile along green line. Green arrow indicates the location of the C–N bridged region. The scale bars in (a), the inset in (a) and (b) are 2.0 nm, 2.0 nm−1 and 2.0 nm, respectively.
Figure 3Experimental and theoretical band gap calculations.
(a) Results of optical band-gap measurements and a plot of the absorbance squared vs. photon energy (hν) extrapolated to zero absorption. The inset is the ultraviolet absorption curve. (b) Cyclic voltammograms of the C2N-h2D crystal at a scan rate of 100 mV s−1 using a Ag/Ag+ reference electrode. (c) The band structure from the zone centre to the M point of the 2D triangular lattice. (d) The density of electronic states. An iso-surface plot of the Kohn–Sham orbital at the gamma point: (e) the conduction-band minimum state; (f) the doubly degenerate valence-band maximum state. The insets in e and f signify the p and σ-orbital characters of the corresponding bands.
Figure 4Field-effect transistor (FET) device study.
(a) Atomic force microscopy image of the C2N-h2D crystal; the scale bar is 7 μm. The height profile (cyan-blue line) was obtained along the cyan-blue line. (b) Optical microscopy image of a C2N-h2D crystal FET prepared on a SiO2(300 nm)/n++ Si wafer. The channel length (L) of the device is 500 nm, and the channel width-to-length (W/L)=13. The inset is an optical microscopy image taken before the deposition of Au electrodes on the crystal. The scale bars are 60 μm. (c) Transfer curves of the C2N-h2D crystal FET devices measured at 25 °C under 5 × 10−6 torr (VDS=−30 V).