| Literature DB >> 25676825 |
Junyeon Kwon1, Young Ki Hong, Gyuchull Han, Inturu Omkaram, Woong Choi, Sunkook Kim, Youngki Yoon.
Abstract
Local-gate multilayer MoS2 phototransistors exhibit a photoresponsivity of up to 342.6 A W(-1) , which is higher by 3 orders of magnitude than that of global-gate multilayer MoS2 phototransistors. These simulations indicate that the gate underlap is critical for the enhancement of the photoresponsivity. These results suggest that high photoresponsivity can be achieved in indirect-bandgap multilayer MoS2 phototransistors by optimizing the optoelectronic design.Keywords: MoS2; local-bottom gated structure; phototransistors; responsivity; transition metal dichalcogenide
Year: 2015 PMID: 25676825 DOI: 10.1002/adma.201404367
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849