| Literature DB >> 25551044 |
Jörg Buchwald1, Marina Sarmanova1, Bernd Rauschenbach2, Stefan G Mayr3.
Abstract
The mechanical properties of surfaces and nanostructures deviate from their bulk counterparts due to surface stress and reduced dimensionality. Experimental indentation-based techniques present the challenge of measuring these effects, while avoiding artifacts caused by the measurement technique itself. We performed a molecular dynamics study to investigate the mechanical properties of a GaN step of only a few lattice constants step height and scrutinized its applicability to indentation experiments using a finite element approach (FEM). We show that the breakdown of half-space symmetry leads to an "artificial" reduction of the elastic properties of comparable lateral dimensions which overlays the effect of surface stress. Contact resonance atomic force microscopy (CR-AFM) was used to compare the simulation results with experiments.Entities:
Keywords: finite elements; gallium nitride; indentation; mechanical properties; molecular dynamics; nanostructures
Year: 2014 PMID: 25551044 PMCID: PMC4273285 DOI: 10.3762/bjnano.5.225
Source DB: PubMed Journal: Beilstein J Nanotechnol ISSN: 2190-4286 Impact factor: 3.649
Figure 1MD configuration of a GaN step with a step height of h = 2c during indentation of surface atoms within a circular area of A2 = 1.232 nm2. The red spheres denote the gallium and blue spheres the nitrogen atoms.
Figure 2Stress fluctuation multiplied by the squared per-atom volume along the y-axis of the upper Ga atoms.
Figure 3Local [001]-oriented indentation modulus for three different step heights along the y-axis. Measured by indenting a single atom (A1 = 0.088 nm2). The error bars denote the standard deviation of the displacement and apply to all data points.
Figure 4[001]-oriented indentation modulus for three different step heights along y. Measured by indenting a circular region of surface atoms (A2 = 1.232 nm2). The error bars denote the standard deviation of the displacement and apply to all data points.
Figure 5Schematic FEM configuration of the indentation on top of the step by using a flatpunch indenter.
Figure 6FEM simulation of indentation modulus for three different step heights by using a flatpunch indenter (A2 = 1.232 nm2).
Figure 7Topography (a) and indentation modulus (b) map of the area around a GaN step.