Literature DB >> 24915057

Experimental observation of negative capacitance in ferroelectrics at room temperature.

Daniel J R Appleby1, Nikhil K Ponon, Kelvin S K Kwa, Bin Zou, Peter K Petrov, Tianle Wang, Neil M Alford, Anthony O'Neill.   

Abstract

Effective negative capacitance has been postulated in ferroelectrics because there is a hysteresis in plots of polarization-electric field. Compelling experimental evidence of effective negative capacitance is presented here at room temperature in engineered devices, where it is stabilized by the presence of a paraelectric material. In future integrated circuits, the incorporation of such negative capacitance into MOSFET gate stacks would reduce the subthreshold slope, enabling low power operation and reduced self-heating.

Year:  2014        PMID: 24915057     DOI: 10.1021/nl5017255

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  10 in total

1.  Negative capacitance in a ferroelectric capacitor.

Authors:  Asif Islam Khan; Korok Chatterjee; Brian Wang; Steven Drapcho; Long You; Claudy Serrao; Saidur Rahman Bakaul; Ramamoorthy Ramesh; Sayeef Salahuddin
Journal:  Nat Mater       Date:  2014-12-15       Impact factor: 43.841

2.  Negative capacitance in multidomain ferroelectric superlattices.

Authors:  Pavlo Zubko; Jacek C Wojdeł; Marios Hadjimichael; Stéphanie Fernandez-Pena; Anaïs Sené; Igor Luk'yanchuk; Jean-Marc Triscone; Jorge Íñiguez
Journal:  Nature       Date:  2016-06-13       Impact factor: 49.962

3.  Ultrathin ferroic HfO2-ZrO2 superlattice gate stack for advanced transistors.

Authors:  Suraj S Cheema; Nirmaan Shanker; Li-Chen Wang; Cheng-Hsiang Hsu; Shang-Lin Hsu; Yu-Hung Liao; Matthew San Jose; Jorge Gomez; Wriddhi Chakraborty; Wenshen Li; Jong-Ho Bae; Steve K Volkman; Daewoong Kwon; Yoonsoo Rho; Gianni Pinelli; Ravi Rastogi; Dominick Pipitone; Corey Stull; Matthew Cook; Brian Tyrrell; Vladimir A Stoica; Zhan Zhang; John W Freeland; Christopher J Tassone; Apurva Mehta; Ghazal Saheli; David Thompson; Dong Ik Suh; Won-Tae Koo; Kab-Jin Nam; Dong Jin Jung; Woo-Bin Song; Chung-Hsun Lin; Seunggeol Nam; Jinseong Heo; Narendra Parihar; Costas P Grigoropoulos; Padraic Shafer; Patrick Fay; Ramamoorthy Ramesh; Souvik Mahapatra; Jim Ciston; Suman Datta; Mohamed Mohamed; Chenming Hu; Sayeef Salahuddin
Journal:  Nature       Date:  2022-04-06       Impact factor: 69.504

4.  Alternative interpretations for decreasing voltage with increasing charge in ferroelectric capacitors.

Authors:  Seul Ji Song; Yu Jin Kim; Min Hyuk Park; Young Hwan Lee; Han Joon Kim; Taehwan Moon; Keum Do Kim; Jung-Hae Choi; Zhihui Chen; Anquan Jiang; Cheol Seong Hwang
Journal:  Sci Rep       Date:  2016-02-11       Impact factor: 4.379

Review 5.  A review of molecular beam epitaxy of ferroelectric BaTiO3 films on Si, Ge and GaAs substrates and their applications.

Authors:  Lucie Mazet; Sang Mo Yang; Sergei V Kalinin; Sylvie Schamm-Chardon; Catherine Dubourdieu
Journal:  Sci Technol Adv Mater       Date:  2015-06-30       Impact factor: 8.090

6.  Negative Capacitance as Universal Digital and Analog Performance Booster for Complementary MOS Transistors.

Authors:  Ali Saeidi; Farzan Jazaeri; Igor Stolichnov; Christian C Enz; Adrian M Ionescu
Journal:  Sci Rep       Date:  2019-06-24       Impact factor: 4.379

Review 7.  Why Do Ferroelectrics Exhibit Negative Capacitance?

Authors:  Michael Hoffmann; Prasanna Venkatesan Ravindran; Asif Islam Khan
Journal:  Materials (Basel)       Date:  2019-11-13       Impact factor: 3.623

8.  Sub-kT/q Subthreshold-Slope Using Negative Capacitance in Low-Temperature Polycrystalline-Silicon Thin-Film Transistor.

Authors:  Jae Hyo Park; Gil Su Jang; Hyung Yoon Kim; Ki Hwan Seok; Hee Jae Chae; Sol Kyu Lee; Seung Ki Joo
Journal:  Sci Rep       Date:  2016-04-21       Impact factor: 4.379

9.  Frustration of Negative Capacitance in Al2O3/BaTiO3 Bilayer Structure.

Authors:  Yu Jin Kim; Min Hyuk Park; Young Hwan Lee; Han Joon Kim; Woojin Jeon; Taehwan Moon; Keum Do Kim; Doo Seok Jeong; Hiroyuki Yamada; Cheol Seong Hwang
Journal:  Sci Rep       Date:  2016-01-08       Impact factor: 4.379

Review 10.  Steep switching devices for low power applications: negative differential capacitance/resistance field effect transistors.

Authors:  Eunah Ko; Jaemin Shin; Changhwan Shin
Journal:  Nano Converg       Date:  2018-01-28
  10 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.