Literature DB >> 23802773

Where does the current flow in two-dimensional layered systems?

Saptarshi Das1, Joerg Appenzeller.   

Abstract

In this Letter, we map for the first time the current distribution among the individual layers of multilayer two-dimensional systems. Our findings suggest that in a multilayer MoS2 field-effect transistor the "HOT-SPOT" of the current flow migrates dynamically between the layers as a function of the applied back gate bias and manifests itself in a rather unusual "contact resistance" that cannot be explained using the conventional models for metal-to-semiconductor contacts. To interpret this unique contact resistance, extracted from a channel length scaling study, we employed a resistor network model based on Thomas-Fermi charge screening and interlayer coupling. By modeling our experimental data we have found that the charge screening length for MoS2 is rather large (λMoS2 = 7 nm) and translates into a current distribution in multilayer MoS2 systems, which is distinctly different from the current distribution in multilayer graphenegraphene = 0.6 nm). In particular, our experimental results allow us to retrieve for the first time fundamental information about the carrier transport in two-dimensional layered systems that will likely play an important role in the implementation of future electronics components but that have not been evaluated in the past.

Entities:  

Year:  2013        PMID: 23802773     DOI: 10.1021/nl401831u

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  15 in total

1.  Multi-terminal transport measurements of MoS2 using a van der Waals heterostructure device platform.

Authors:  Xu Cui; Gwan-Hyoung Lee; Young Duck Kim; Ghidewon Arefe; Pinshane Y Huang; Chul-Ho Lee; Daniel A Chenet; Xian Zhang; Lei Wang; Fan Ye; Filippo Pizzocchero; Bjarke S Jessen; Kenji Watanabe; Takashi Taniguchi; David A Muller; Tony Low; Philip Kim; James Hone
Journal:  Nat Nanotechnol       Date:  2015-04-27       Impact factor: 39.213

2.  Phase-engineered low-resistance contacts for ultrathin MoS2 transistors.

Authors:  Rajesh Kappera; Damien Voiry; Sibel Ebru Yalcin; Brittany Branch; Gautam Gupta; Aditya D Mohite; Manish Chhowalla
Journal:  Nat Mater       Date:  2014-08-31       Impact factor: 43.841

3.  Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures.

Authors:  Ruei-San Chen; Chih-Che Tang; Wei-Chu Shen; Ying-Sheng Huang
Journal:  J Vis Exp       Date:  2015-12-05       Impact factor: 1.355

4.  Gate-Controlled WSe2 Transistors Using a Buried Triple-Gate Structure.

Authors:  M R Müller; R Salazar; S Fathipour; H Xu; K Kallis; U Künzelmann; A Seabaugh; J Appenzeller; J Knoch
Journal:  Nanoscale Res Lett       Date:  2016-11-22       Impact factor: 4.703

5.  HfSe2 and ZrSe2: Two-dimensional semiconductors with native high-κ oxides.

Authors:  Michal J Mleczko; Chaofan Zhang; Hye Ryoung Lee; Hsueh-Hui Kuo; Blanka Magyari-Köpe; Robert G Moore; Zhi-Xun Shen; Ian R Fisher; Yoshio Nishi; Eric Pop
Journal:  Sci Adv       Date:  2017-08-11       Impact factor: 14.136

6.  Gate Tunable Transport in Graphene/MoS₂/(Cr/Au) Vertical Field-Effect Transistors.

Authors:  Ghazanfar Nazir; Muhammad Farooq Khan; Sikandar Aftab; Amir Muhammad Afzal; Ghulam Dastgeer; Malik Abdul Rehman; Yongho Seo; Jonghwa Eom
Journal:  Nanomaterials (Basel)       Date:  2017-12-28       Impact factor: 5.076

7.  Two-dimensional electronic transport and surface electron accumulation in MoS2.

Authors:  M D Siao; W C Shen; R S Chen; Z W Chang; M C Shih; Y P Chiu; C-M Cheng
Journal:  Nat Commun       Date:  2018-04-12       Impact factor: 14.919

8.  Oxide-mediated recovery of field-effect mobility in plasma-treated MoS2.

Authors:  Jakub Jadwiszczak; Colin O'Callaghan; Yangbo Zhou; Daniel S Fox; Eamonn Weitz; Darragh Keane; Conor P Cullen; Ian O'Reilly; Clive Downing; Aleksey Shmeliov; Pierce Maguire; John J Gough; Cormac McGuinness; Mauro S Ferreira; A Louise Bradley; John J Boland; Georg S Duesberg; Valeria Nicolosi; Hongzhou Zhang
Journal:  Sci Adv       Date:  2018-03-02       Impact factor: 14.136

9.  Understanding contact gating in Schottky barrier transistors from 2D channels.

Authors:  Abhijith Prakash; Hesameddin Ilatikhameneh; Peng Wu; Joerg Appenzeller
Journal:  Sci Rep       Date:  2017-10-03       Impact factor: 4.379

10.  Phase Modulators Based on High Mobility Ambipolar ReSe2 Field-Effect Transistors.

Authors:  Nihar R Pradhan; Carlos Garcia; Bridget Isenberg; Daniel Rhodes; Simin Feng; Shahriar Memaran; Yan Xin; Amber McCreary; Angela R Hight Walker; Aldo Raeliarijaona; Humberto Terrones; Mauricio Terrones; Stephen McGill; Luis Balicas
Journal:  Sci Rep       Date:  2018-08-24       Impact factor: 4.379

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