| Literature DB >> 23710256 |
Chang-Hee Cho1, Carlos O Aspetti, Joohee Park, Ritesh Agarwal.
Abstract
Due to limitations in device speed and performance of silicon-based electronics, silicon optoelectronics has been extensively studied to achieve ultrafast optical-data processing1-3. However, the biggest challenge has been to develop an efficient silicon-based light source since indirect band-gap of silicon gives rise to extremely low emission efficiency. Although light emission in quantum-confined silicon at sub-10 nm lengthscales has been demonstrated4-7, there are difficulties in integrating quantum structures with conventional electronics8,9. It is desirable to develop new concepts to obtain emission from silicon at lengthscales compatible with current electronic devices (20-100 nm), which therefore do not utilize quantum-confinement effects. Here, we demonstrate an entirely new method to achieve bright visible light emission in "bulk-sized" silicon coupled with plasmon nanocavities from non-thermalized carrier recombination. Highly enhanced emission quantum efficiency (>1%) in plasmonic silicon, along with its size compatibility with present silicon electronics, provides new avenues for developing monolithically integrated light-sources on conventional microchips.Entities:
Year: 2013 PMID: 23710256 PMCID: PMC3661302 DOI: 10.1038/nphoton.2013.25
Source DB: PubMed Journal: Nat Photonics ISSN: 1749-4885 Impact factor: 38.771