Examining the inflammatory response to nanopatterned polydimethylsiloxane using organotypic brain slice methods.

A long-term effect of chronically implanted neural electrodes is the formation of a glial scar made up of reactive astrocytes, microglia and the matrix proteins they generate. Studies have shown glial fibrillary acidic protein (GFAP) and cytokines interleukin-1beta (IL-1β), tumor necrosis factor alpha (TNFα), and transforming growth factor beta 1 (TGFβ1) are involved with the initial and modulation phases of reactive astrogliosis. In the present study, nanopatterning of polydimethylsiloxane (PDMS) was attempted as a method for reducing the inflammatory response of glial cells. A unique feature of this study is the use of in vitro brain slice cultures (organotypic cultures) in order to more accurately depict the native response. The aim of the study was to determine whether nanotopography could reduce inflammatory signals typically resultant from neural electrode implantation. Specifically, observation of cell alignment and surveillance of GFAP, IL-1β, TNFα, and TGFβ1 gene expression around the PDMS pins was performed. Results of this study confirm nanopatterning not only influences cell morphology, but some of the molecular signals as well. These results collectively indicate nanopatterning improves the biocompatibility of PDMS by reducing inflammatory markers such as GFAP, IL-1β, TGFβ1 and TNFα compared to the non-patterned PDMS pins.