| Literature DB >> 22799885 |
Jiang Pu1, Yohei Yomogida, Keng-Ku Liu, Lain-Jong Li, Yoshihiro Iwasa, Taishi Takenobu.
Abstract
Molybdenum disulfide (MoS(2)) thin-film transistors were fabricated with ion gel gate dielectrics. These thin-film transistors exhibited excellent band transport with a low threshold voltage (<1 V), high mobility (12.5 cm(2)/(V·s)) and a high on/off current ratio (10(5)). Furthermore, the MoS(2) transistors exhibited remarkably high mechanical flexibility, and no degradation in the electrical characteristics was observed when they were significantly bent to a curvature radius of 0.75 mm. The superior electrical performance and excellent pliability of MoS(2) films make them suitable for use in large-area flexible electronics.Entities:
Year: 2012 PMID: 22799885 DOI: 10.1021/nl301335q
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189