| Literature DB >> 22003461 |
Miriam Jaafar1, Oscar Iglesias-Freire, Luis Serrano-Ramón, Manuel Ricardo Ibarra, Jose Maria de Teresa, Agustina Asenjo.
Abstract
The most outstanding feature of scanning force microscopy (SFM) is its capability to detect various different short and long range interactions. In particular, magnetic force microscopy (MFM) is used to characterize the domain configuration in ferromagnetic materials such as thin films grown by physical techniques or ferromagnetic nanostructures. It is a usual procedure to separate the topography and the magnetic signal by scanning at a lift distance of 25-50 nm such that the long range tip-sample interactions dominate. Nowadays, MFM is becoming a valuable technique to detect weak magnetic fields arising from low dimensional complex systems such as organic nanomagnets, superparamagnetic nanoparticles, carbon-based materials, etc. In all these cases, the magnetic nanocomponents and the substrate supporting them present quite different electronic behavior, i.e., they exhibit large surface potential differences causing heterogeneous electrostatic interaction between the tip and the sample that could be interpreted as a magnetic interaction. To distinguish clearly the origin of the tip-sample forces we propose to use a combination of Kelvin probe force microscopy (KPFM) and MFM. The KPFM technique allows us to compensate in real time the electrostatic forces between the tip and the sample by minimizing the electrostatic contribution to the frequency shift signal. This is a great challenge in samples with low magnetic moment. In this work we studied an array of Co nanostructures that exhibit high electrostatic interaction with the MFM tip. Thanks to the use of the KPFM/MFM system we were able to separate the electric and magnetic interactions between the tip and the sample.Entities:
Keywords: Kelvin probe force microscopy; electrostatic interaction; focused electron beam induced deposition; magnetic force microscopy; magnetic nanostructures
Year: 2011 PMID: 22003461 PMCID: PMC3190625 DOI: 10.3762/bjnano.2.59
Source DB: PubMed Journal: Beilstein J Nanotechnol ISSN: 2190-4286 Impact factor: 3.649
Values of the FvdW, Fe and Fm for three different tip–sample distances, da.
| 5.0 × 10−4 | 2.3 × 10−2 | 5.7 × 10−2 | |
| 1.2 × 10−1 | 1.3 × 10−1 | 4.4 × 10−1 | |
| 5.0 × 10−1 | 1.6 × 10−1 | 4.9 × 10−1 | |
aThe value of z corresponds to d in the case of FvdW; for the Fe case z = d + 2 nm due to the existence of an oxide layer; and for Fm z = d + 40 nm due to the position of the dipole centers.
Figure 1(a) Topography and (b) frequency shift images corresponding to the Co wires; (d) topography and (e) frequency shift images corresponding to the L-shape nanostructure. The frequency shift images were acquired at a retrace distance of 30 nm with Vbias = 0V. Cantilever amplitude: (a–b) A = 5 nm and (d–e) A = 8.5 nm. Simulated maps of the magnetization distribution (divM) obtained by OOMMF code of the Co wire (c) and L-shape Co nanostructure (f) in the remanent state after saturation along the main axis of the elements.
Figure 2(a) Topography of the Co wire. The dashed line corresponds to continuous scanning along the profile while varying the bias voltage. (b) Frequency shift signal measured in the 3D mode (acquired at a distance of 100 nm). The fast scan corresponds to the x-axis scan all along the main axis of the Co wire and the slow scan is the bias voltage applied between the tip and the sample. (c) Frequency shift curves measured along the vertical profiles marked in (b) that correspond to the Co wire (black line) and substrate (red line). (d) Frequency shift measured along the wire at Vbias = 320 mV (horizontal dashed black line marked in Figure 2b). The oscillation amplitude was A = 7 nm and the scan rate was 1 Hz.
Figure 3Topography of (a) Co nanowires and (e) L-shaped Co nanostructure. (b) and (f) frequency shift images measured without KPFM acquired at a retrace distance of 30 nm and 25 nm respectively. (c) and (g) surface potential images obtained by the KPFM technique. (d) and (h) MFM images (frequency shift) of the Co nanostructures measured when the KPFM bias correction was switched on. The oscillation amplitudes were (a–d) A = 5 nm and (e–h) A = 8.5 nm.
Figure 4(a) Sketch of the different feedback loops used to perform MFM measurements with PLL system activated and (b) sketch of the MFM/KPFM combined system.