Literature DB >> 21859101

FeTRAM. An organic ferroelectric material based novel random access memory cell.

Saptarshi Das1, Joerg Appenzeller.   

Abstract

Science and technology in the electronics area have always been driven by the development of materials with unique properties and their integration into novel device concepts with the ultimate goal to enable new functionalities in innovative circuit architectures. In particular, a shift in paradigm requires a synergistic approach that combines materials, devices and circuit aspects simultaneously. Here we report the experimental implementation of a novel nonvolatile memory cell that combines silicon nanowires with an organic ferroelectric polymer-PVDF-TrFE-into a new ferroelectric transistor architecture. Our new cell, the ferroelectric transistor random access memory (FeTRAM) exhibits similarities with state-of-the-art ferroelectric random access memories (FeRAMs) in that it utilizes a ferroelectric material to store information in a nonvolatile (NV) fashion but with the added advantage of allowing for nondestructive readout. This nondestructive readout is a result of information being stored in our cell using a ferroelectric transistor instead of a capacitor-the scheme commonly employed in conventional FeRAMs.

Entities:  

Year:  2011        PMID: 21859101     DOI: 10.1021/nl2023993

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  4 in total

1.  Electronics: inside story of ferroelectric memories.

Authors:  Vincent Garcia; Manuel Bibes
Journal:  Nature       Date:  2012-03-14       Impact factor: 49.962

2.  Local Maps of the Polarization and Depolarization in Organic Ferroelectric Field-Effect Transistors.

Authors:  Ronggang Cai; Alain M Jonas
Journal:  Sci Rep       Date:  2016-02-24       Impact factor: 4.379

3.  Low-Programmable-Voltage Nonvolatile Memory Devices Based on Omega-shaped Gate Organic Ferroelectric P(VDF-TrFE) Field Effect Transistors Using p-type Silicon Nanowire Channels.

Authors:  Ngoc Huynh Van; Jae-Hyun Lee; Dongmok Whang; Dae Joon Kang
Journal:  Nanomicro Lett       Date:  2014-10-23

4.  Van der Waals engineering of ferroelectric heterostructures for long-retention memory.

Authors:  Xiaowei Wang; Chao Zhu; Ya Deng; Ruihuan Duan; Jieqiong Chen; Qingsheng Zeng; Jiadong Zhou; Qundong Fu; Lu You; Song Liu; James H Edgar; Peng Yu; Zheng Liu
Journal:  Nat Commun       Date:  2021-02-17       Impact factor: 14.919

  4 in total

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