Literature DB >> 21425217

Formation of boron-based films and boron nitride layers by CVD of a boron ester.

Hermann Sachdev1, Frank Müller, Stefan Hüfner.   

Abstract

Entities:  

Year:  2011        PMID： 21425217     DOI： 10.1002/anie.201003012

Source DB:  PubMed          Journal:  Angew Chem Int Ed Engl        ISSN： 1433-7851            Impact factor:   15.336


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  2 in total

1.  Controlling Catalyst Bulk Reservoir Effects for Monolayer Hexagonal Boron Nitride CVD.

Authors:  Sabina Caneva; Robert S Weatherup; Bernhard C Bayer; Raoul Blume; Andrea Cabrero-Vilatela; Philipp Braeuninger-Weimer; Marie-Blandine Martin; Ruizhi Wang; Carsten Baehtz; Robert Schloegl; Jannik C Meyer; Stephan Hofmann
Journal:  Nano Lett       Date:  2016-01-19       Impact factor: 11.189

2.  Formation mechanisms of boron oxide films fabricated by large-area electron beam-induced deposition of trimethyl borate.

Authors:  Aiden A Martin; Philip J Depond
Journal:  Beilstein J Nanotechnol       Date:  2018-04-24       Impact factor: 3.649
  2 in total

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