Literature DB >> 20730812

Epitaxial graphene growth by carbon molecular beam epitaxy (CMBE).

Jeongho Park1, William C Mitchel, Lawrence Grazulis, Howard E Smith, Kurt G Eyink, John J Boeckl, David H Tomich, Shanee D Pacley, John E Hoelscher.   

Abstract

A novel growth method (carbon molecular beam epitaxy (CMBE)) has been developed to produce high-quality and large-area epitaxial graphene. This method demonstrates significantly improved controllability of the graphene growth. CMBE with C(60) produces AB stacked graphene, while growth with the graphite filament results in non-Bernal stacked graphene layers with a Dirac-like electronic structure, which is similar to graphene grown by thermal decomposition on SiC (000-1).

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Year:  2010        PMID: 20730812     DOI: 10.1002/adma.201000756

Source DB:  PubMed          Journal:  Adv Mater        ISSN: 0935-9648            Impact factor:   30.849


  13 in total

1.  A role for graphene in silicon-based semiconductor devices.

Authors:  Kinam Kim; Jae-Young Choi; Taek Kim; Seong-Ho Cho; Hyun-Jong Chung
Journal:  Nature       Date:  2011-11-16       Impact factor: 49.962

2.  Approach to multifunctional device platform with epitaxial graphene on transition metal oxide.

Authors:  Jeongho Park; Tyson Back; William C Mitchel; Steve S Kim; Said Elhamri; John Boeckl; Steven B Fairchild; Rajesh Naik; Andrey A Voevodin
Journal:  Sci Rep       Date:  2015-09-23       Impact factor: 4.379

3.  Direct growth of graphene film on germanium substrate.

Authors:  Gang Wang; Miao Zhang; Yun Zhu; Guqiao Ding; Da Jiang; Qinglei Guo; Su Liu; Xiaoming Xie; Paul K Chu; Zengfeng Di; Xi Wang
Journal:  Sci Rep       Date:  2013       Impact factor: 4.379

4.  An atomic carbon source for high temperature molecular beam epitaxy of graphene.

Authors:  J D Albar; A Summerfield; T S Cheng; A Davies; E F Smith; A N Khlobystov; C J Mellor; T Taniguchi; K Watanabe; C T Foxon; L Eaves; P H Beton; S V Novikov
Journal:  Sci Rep       Date:  2017-07-26       Impact factor: 4.379

Review 5.  Nanomaterials: certain aspects of application, risk assessment and risk communication.

Authors:  Peter Laux; Jutta Tentschert; Christian Riebeling; Albert Braeuning; Otto Creutzenberg; Astrid Epp; Valérie Fessard; Karl-Heinz Haas; Andrea Haase; Kerstin Hund-Rinke; Norbert Jakubowski; Peter Kearns; Alfonso Lampen; Hubert Rauscher; Reinhilde Schoonjans; Angela Störmer; Axel Thielmann; Uwe Mühle; Andreas Luch
Journal:  Arch Toxicol       Date:  2017-12-22       Impact factor: 5.153

Review 6.  Direct CVD Growth of Graphene on Technologically Important Dielectric and Semiconducting Substrates.

Authors:  Afzal Khan; Sk Masiul Islam; Shahzad Ahmed; Rishi R Kumar; Mohammad R Habib; Kun Huang; Ming Hu; Xuegong Yu; Deren Yang
Journal:  Adv Sci (Weinh)       Date:  2018-09-22       Impact factor: 16.806

7.  High-Yield Production of Few-Layer Graphene via New-fashioned Strategy Combining Resonance Ball Milling and Hydrothermal Exfoliation.

Authors:  Qingfeng Yang; Ming Zhou; Mingyang Yang; Zhixun Zhang; Jianwen Yu; Yibo Zhang; Wenjun Cheng; Xuyin Li
Journal:  Nanomaterials (Basel)       Date:  2020-04-02       Impact factor: 5.076

8.  In-situ epitaxial growth of graphene/h-BN van der Waals heterostructures by molecular beam epitaxy.

Authors:  Zheng Zuo; Zhongguang Xu; Renjing Zheng; Alireza Khanaki; Jian-Guo Zheng; Jianlin Liu
Journal:  Sci Rep       Date:  2015-10-07       Impact factor: 4.379

9.  In situ observation of step-edge in-plane growth of graphene in a STEM.

Authors:  Zheng Liu; Yung-Chang Lin; Chun-Chieh Lu; Chao-Hui Yeh; Po-Wen Chiu; Sumio Iijima; Kazu Suenaga
Journal:  Nat Commun       Date:  2014-06-02       Impact factor: 14.919

10.  Large-Area Growth of Turbostratic Graphene on Ni(111) via Physical Vapor Deposition.

Authors:  Joseph A Garlow; Lawrence K Barrett; Lijun Wu; Kim Kisslinger; Yimei Zhu; Javier F Pulecio
Journal:  Sci Rep       Date:  2016-01-29       Impact factor: 4.379

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