| Literature DB >> 20706596 |
V Dimitrov1, J Heng, K Timp, O Dimauro, R Chan, M Hafez, J Feng, T Sorsch, W Mansfield, J Miner, A Kornblit, F Klemens, J Bower, R Cirelli, E J Ferry, A Taylor, M Feng, G Timp.
Abstract
We have fabricated and tested the performance of sub-50nm gate nMOSFETs to assess their suitability for mixed signal applications in the super high frequency (SHF) band, i.e. 3-30GHz. For a 30nm×40 μm×2 device, we found f(T) =465GHz at V(ds)=2V, V(g)=0.67V, which is the highest cut-off frequency reported for a MOSFET produced on bulk silicon substrate so far. However, our measurements of f(max) and noise figure indicate that parasitics impose limitations on SHF operation. We also present a high-frequency ac model appropriate to sub-50nm gate length nanotransistors, which incorporates the effects of the parasitics. The model accurately accounts for measurements of the S and Y parameters in the frequency range from 1 to 50GHz.Entities:
Year: 2008 PMID: 20706596 PMCID: PMC2919744 DOI: 10.1016/j.sse.2008.01.025
Source DB: PubMed Journal: Solid State Electron ISSN: 0038-1101 Impact factor: 1.901