Literature DB >> 15892359

Self-curing, self-etching adhesive cement systems.

Ulrich Salz1, Jörg Zimmermann, Tobias Salzer.   

Abstract

PURPOSE: To investigate the influence of the acid-base reaction between acidic monomers and amines on the polymerization behavior of self-etching, self-curing adhesives, determine the effect of the application mode on the shear bond strength and morphology, and elucidate the adhesion performance of such systems by shear bond strength measurements.
MATERIALS AND METHODS: The amine redox-initiator system N,N-di(2-hydroxyethyl)p-toluene (DEPT)/dibenzoyl peroxide (BPO) was selected to investigate the influence of the amine-base reaction on polymerization behavior. The PKa value of DEPT hydrochloride was measured by titration with NaOH. The influence of the pH value and DEPT concentration on the polymerization rate of methacrylates was investigated by exotherm time measurements. Three different application protocols of Multilink Primer (Ivoclar Vivadent) and Panavia 21 ED-Primer (Kuraray) were tested, 15 s passive vs 15 s agitation vs 60 s passive in combination with the corresponding resin luting material. The effects of these three application protocols were evaluated and monitored by both shear bond strength tests and SEM characterization of the surface morphology. The adhesion potential of these self-etching, self-curing luting systems was compared on enamel and dentin both directly after application and after 24 h.
RESULTS: The pKa of DEPT-HCl is 4.45. The polymerization rate of the DEPT-containing, self-etching, self-curing adhesive system is highly influenced by both the amine concentration and the pH value. In the case of Multilink, agitation of the primer mixture for 15 s, especially on dentin, resulted in a higher bond strength and a more pronounced removal of the smear layer. Multilink resulted in statistically higher bond strengths (p < 0.05) than Panavia 21 for both the enamel and dentin directly after application and for the dentin after 24 h.
CONCLUSION: Radical polymerization initiators used in self-curing systems are strongly adversely affected by acidic monomers incorporated in self-etching adhesives. However, if there is a good adjustment of these components and effects of adhesive application are taken in account, high bond strengths can be achieved.

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Year:  2005        PMID: 15892359

Source DB:  PubMed          Journal:  J Adhes Dent        ISSN: 1461-5185            Impact factor:   2.359


  11 in total

1.  Elution of monomers from three different bonding systems and their antibacterial effect.

Authors:  Olga Polydorou; Philipp Rogatti; Richard Bolek; Martin Wolkewitz; Klaus Kümmerer; Elmar Hellwig
Journal:  Odontology       Date:  2012-06-10       Impact factor: 2.634

2.  Distinct photopolymerization efficacy on dentin of self-etch adhesives.

Authors:  Y Zhang; Y Wang
Journal:  J Dent Res       Date:  2012-06-26       Impact factor: 6.116

3.  Hydroxyapatite effect on photopolymerization of self-etching adhesives with different aggressiveness.

Authors:  Ying Zhang; Yong Wang
Journal:  J Dent       Date:  2012-03-22       Impact factor: 4.379

4.  The effect of hydroxyapatite presence on the degree of conversion and polymerization rate in a model self-etching adhesive.

Authors:  Ying Zhang; Yong Wang
Journal:  Dent Mater       Date:  2011-10-26       Impact factor: 5.304

5.  Effect of double-layer application on the early enamel bond strength of universal adhesives.

Authors:  Eizo Hirokane; Toshiki Takamizawa; Yuta Kasahara; Ryo Ishii; Akimasa Tsujimoto; Wayne W Barkmeier; Mark A Latta; Masashi Miyazaki
Journal:  Clin Oral Investig       Date:  2020-05-30       Impact factor: 3.573

6.  Improved degree of conversion of model self-etching adhesives through their interaction with dentine.

Authors:  Ying Zhang; Yong Wang
Journal:  J Dent       Date:  2011-10-18       Impact factor: 4.379

7.  Effect of reactive and un-reactive substrates on photopolymerization of self-etching adhesives with different aggressiveness.

Authors:  Ying Zhang; Yong Wang
Journal:  Dent Mater J       Date:  2013       Impact factor: 2.102

8.  Photopolymerization of phosphoric acid ester-based self-etch dental adhesives.

Authors:  Ying Zhang; Yong Wang
Journal:  Dent Mater J       Date:  2013       Impact factor: 2.102

9.  Hydroxyapatite induces spontaneous polymerization of model self-etch dental adhesives.

Authors:  Ying Zhang; Ningjing Wu; Xinyan Bai; Changqi Xu; Yi Liu; Yong Wang
Journal:  Mater Sci Eng C Mater Biol Appl       Date:  2013-05-03       Impact factor: 7.328

10.  Tertiary Amine and Tooth Mineral Hydroxyapatite Facilely Trigger Self-cure of 10-MDP Based Adhesives.

Authors:  Hang Liu; Yong Wang
Journal:  Int J Adhes Adhes       Date:  2019-05-15       Impact factor: 3.189

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