Literature DB >> 9998105

Hydrogen bonding in amorphous silicon with use of the low-pressure chemical-vapor-deposition technique.

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Abstract

Entities:  

Year:  1991        PMID： 9998105     DOI： 10.1103/physrevb.43.6627

Source DB:  PubMed          Journal:  Phys Rev B Condens Matter        ISSN： 0163-1829


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  1 in total

1.  On the formation of blisters in annealed hydrogenated a-Si layers.

Authors:  Miklós Serényi; Cesare Frigeri; Zsolt Szekrényes; Katalin Kamarás; Lucia Nasi; Attila Csik; Nguyen Quoc Khánh
Journal:  Nanoscale Res Lett       Date:  2013-02-15       Impact factor: 4.703
  1 in total

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