Literature DB >> 9976466

Electrical properties of He-implantation-produced nanocavities in silicon.

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Abstract

Entities:  

Year:  1994        PMID: 9976466     DOI: 10.1103/physrevb.50.2458

Source DB:  PubMed          Journal:  Phys Rev B Condens Matter        ISSN: 0163-1829


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  1 in total

1.  The microstructure of Si surface layers after plasma-immersion He+ ion implantation and subsequent thermal annealing.

Authors:  Andrey Lomov; Kirill Shcherbachev; Yurii Chesnokov; Dmitry Kiselev
Journal:  J Appl Crystallogr       Date:  2017-03-22       Impact factor: 3.304

  1 in total

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