Literature DB >> 9943726

Critical behavior of the electrical resistance of very thin Cr films.

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Abstract

Entities:  

Year:  1988        PMID： 9943726     DOI： 10.1103/physrevb.37.5423

Source DB:  PubMed          Journal:  Phys Rev B Condens Matter        ISSN： 0163-1829


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  1 in total

1.  Influence Mechanism of Cu Layer Thickness on Photoelectric Properties of IWO/Cu/IWO Films.

Authors:  Fengbo Han; Wenyuan Zhao; Ran Bi; Feng Tian; Yadan Li; Chuantao Zheng; Yiding Wang
Journal:  Materials (Basel)       Date:  2019-12-25       Impact factor: 3.623
  1 in total

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