Literature DB >> 9938035

Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition.

.   

Abstract

Entities:  

Year:  1986        PMID： 9938035     DOI： 10.1103/physrevb.33.7069

Source DB:  PubMed          Journal:  Phys Rev B Condens Matter        ISSN： 0163-1829


× No keyword cloud information.
  3 in total

1.  Nitrogen interaction with hydrogen-terminated silicon surfaces at the atomic scale.

Authors:  Min Dai; Yu Wang; Jinhee Kwon; Mathew D Halls; Yves J Chabal
Journal:  Nat Mater       Date:  2009-08-16       Impact factor: 43.841

2.  Silicon Nitride Background in Nanophotonic Waveguide Enhanced Raman Spectroscopy.

Authors:  Ashim Dhakal; Pieter Wuytens; Ali Raza; Nicolas Le Thomas; Roel Baets
Journal:  Materials (Basel)       Date:  2017-02-08       Impact factor: 3.623

3.  Structural and optical characterization of pure Si-rich nitride thin films.

Authors:  Olivier Debieu; Ramesh Pratibha Nalini; Julien Cardin; Xavier Portier; Jacques Perrière; Fabrice Gourbilleau
Journal:  Nanoscale Res Lett       Date:  2013-01-16       Impact factor: 4.703
  3 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.