Literature DB >> 9900467

Copper electrodeposits in paper support.

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Abstract

Entities:  

Year:  1988        PMID: 9900467     DOI: 10.1103/physreva.38.1036

Source DB:  PubMed          Journal:  Phys Rev A Gen Phys        ISSN: 0556-2791


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  1 in total

1.  Electrochemical deposition of layered copper thin films based on the diffusion limited aggregation.

Authors:  Chenhuinan Wei; Guoxing Wu; Sanjun Yang; Qiming Liu
Journal:  Sci Rep       Date:  2016-10-13       Impact factor: 4.379

  1 in total

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