Literature DB >> 9430580

Shape transition of germanium nanocrystals on a silicon (001) surface from pyramids to domes

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Abstract

Chemical vapor deposition of germanium onto the silicon (001) surface at atmospheric pressure and 600 degrees Celsius has previously been shown to produce distinct families of smaller (up to 6 nanometers high) and larger (all approximately 15 nanometers high) nanocrystals. Under ultrahigh-vacuum conditions, physical vapor deposition at approximately the same substrate temperature and growth rate produced a similar bimodal size distribution. In situ scanning tunneling microscopy revealed that the smaller square-based pyramids transform abruptly during growth to significantly larger multifaceted domes, and that few structures with intermediate size and shape remain. Both nanocrystal shapes have size-dependent energy minima that result from the interplay between strain relaxation at the facets and stress concentration at the edges. A thermodynamic model similar to a phase transition accounts for this abrupt morphology change.

Entities:  

Year:  1998        PMID: 9430580     DOI: 10.1126/science.279.5349.353

Source DB:  PubMed          Journal:  Science        ISSN: 0036-8075            Impact factor:   47.728


  23 in total

1.  Hybrid superconductor-semiconductor devices made from self-assembled SiGe nanocrystals on silicon.

Authors:  G Katsaros; P Spathis; M Stoffel; F Fournel; M Mongillo; V Bouchiat; F Lefloch; A Rastelli; O G Schmidt; S De Franceschi
Journal:  Nat Nanotechnol       Date:  2010-05-02       Impact factor: 39.213

2.  A Fokker-Planck reaction model for the epitaxial growth and shape transition of quantum dots.

Authors:  Chaozhen Wei; Brian J Spencer
Journal:  Proc Math Phys Eng Sci       Date:  2017-10-18       Impact factor: 2.704

3.  Excitation Intensity Driven PL Shifts of SiGe Islands on Patterned and Planar Si(001) Substrates: Evidence for Ge-rich Dots in Islands.

Authors:  M Brehm; M Grydlik; F Hackl; E Lausecker; T Fromherz; G Bauer
Journal:  Nanoscale Res Lett       Date:  2010-08-05       Impact factor: 4.703

4.  Optimal Growth Conditions for Selective Ge Islands Positioning on Pit-Patterned Si(001).

Authors:  R Bergamaschini; F Montalenti; L Miglio
Journal:  Nanoscale Res Lett       Date:  2010-08-06       Impact factor: 4.703

5.  Unusual layer-by-layer growth of epitaxial oxide islands during Cu oxidation.

Authors:  Meng Li; Matthew T Curnan; Michael A Gresh-Sill; Stephen D House; Wissam A Saidi; Judith C Yang
Journal:  Nat Commun       Date:  2021-05-13       Impact factor: 14.919

6.  The investigation of selective pre-pattern free self-assembled Ge nano-dot formed by excimer laser annealing.

Authors:  Min-Hung Lee; Pin-Guang Chen
Journal:  Nanoscale Res Lett       Date:  2012-06-18       Impact factor: 4.703

7.  Formation mechanism of SiGe nanorod arrays by combining nanosphere lithography and Au-assisted chemical etching.

Authors:  Chih-Chung Lai; Yun-Ju Lee; Ping-Hung Yeh; Sheng-Wei Lee
Journal:  Nanoscale Res Lett       Date:  2012-02-18       Impact factor: 4.703

8.  Growth of GeSi nanoislands on nanotip-patterned Si (100) substrates with a stress-induced self-limiting interdiffusion.

Authors:  Ruifan Tang; Kai Huang; Hongkai Lai; Cheng Li; Zhiming Wu; Junyong Kang
Journal:  Nanoscale Res Lett       Date:  2012-06-26       Impact factor: 4.703

9.  Size Evolution of Ordered SiGe Islands Grown by Surface Thermal Diffusion on Pit-Patterned Si(100) Surface.

Authors:  Giovanni Maria Vanacore; Maurizio Zani; Monica Bollani; Davide Colombo; Giovanni Isella; Johann Osmond; Roman Sordan; Alberto Tagliaferri
Journal:  Nanoscale Res Lett       Date:  2010-09-30       Impact factor: 4.703

10.  Self-assembled growth of MnSi~1.7 nanowires with a single orientation and a large aspect ratio on Si(110) surfaces.

Authors:  Zhi-Qiang Zou; Wei-Cong Li; Xiao-Yong Liu; Gao-Ming Shi
Journal:  Nanoscale Res Lett       Date:  2013-01-22       Impact factor: 4.703

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